Thermal aspects of LPCVD reactors with constant temperature heating zones

Low pressure chemical vapour deposition (LPCVD) reactors with constant temperature heating zones are examined for their capability to deliver desired temperature profiles for axial film thickness uniformity in nonepitaxial growth. A criterion is developed to estimate the approximate position in the...

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Veröffentlicht in:	Journal of the Electrochemical Society 1990-12, Vol.137 (12), p.3953-3959
Hauptverfasser:	KOOPMAN, D. C, LEE, H. H
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical engineering Exact sciences and technology Reactors
Online-Zugang:	Volltext
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