Copper electrodeposition studies with a reciprocating paddle

Electroplating processes usually are limited by diffusion of the active species to the cathode. Agitation techniques increase mass transfer and thus, the rate of deposition by reducing the diffusion layer thickness. Agitation is performed either by movement of the cathode or the plating solution. A...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of the Electrochemical Society 1988-11, Vol.135 (11), p.2777-2780
Hauptverfasser: RICE, D. E, SUNDSTROM, D, MCEACHERN, M. F, KLUMB, L. A, TALBOT, J. B
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Electroplating processes usually are limited by diffusion of the active species to the cathode. Agitation techniques increase mass transfer and thus, the rate of deposition by reducing the diffusion layer thickness. Agitation is performed either by movement of the cathode or the plating solution. A reciprocating paddle cell has been used to deposit alloy films of uniform thickness on large surface areas. The paddle consists of a pair of confronting, separated triangular blocks aligned parallel to a cathode and was designed in this manner to provide uniform laminar flow. Mass-transfer studies for the electrodeposition of Cu in an aqueous solution of 0.05M CuSO sub 4 and 1M H sub 2 SO sub 4 have been performed recently using this paddle design. In this study, the rate and quality of Cu electrodeposition using a simple rectangular reciprocating paddle agitation device were investigated. . 11 ref.--AA
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2095431