Channeling Study of Epitaxial Aluminium and Silver Films on Si(111) Substrates

Aluminum films formed by the ion cluster beam deposition (ICBD) and Ag films formed by molecular beam epitaxy deposition on Si(111) substrates were studied by MeV ion channeling techniques. Both the Al and Ag films were found to be epitaxial, despite their large lattice mismatch to Si substrates (bo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 1988-11, Vol.B40-B41 (2), p.817-822
Hauptverfasser:	Jin, H-S, Park, K-H, Yapsir, A S
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!