On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers

The influence of the deposition parameters temperature, gas pressure, gas phase composition and r.f. frequency on the mechanical properties of silicon nitride layers prepared by plasma-enhanced deposition was investigated. The results are related to film composition and density, as derived from Ruth...

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Veröffentlicht in:	Thin solid films 1985-01, Vol.129 (3), p.239-247
Hauptverfasser:	Claassen, W.A.P., Valkenburg, W.G.J.M., Wijgert, W.M.v.d., Willemsen, M.F.C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physical properties of thin films, nonelectronic Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
Online-Zugang:	Volltext
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