Interfacial properties of InP and phosphorus deposited at low temperature

We are reporting on a large reduction in the density of states on the InP surface by a phosphorus overlayer. Phosphorus, which is deposited at low temperatures, is a high-resistivity amorphous semiconductor that provides chemical and physical continuity at the interface. The density of surface state...

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Veröffentlicht in:Applied physics letters 1985-01, Vol.47 (3), p.272-274
Hauptverfasser: SCHACHTER, R, OLEGO, D. J, BAUMANN, J. A, BUNZ, L. A, RACCAH, P. M, SPICER, W. E
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container_end_page 274
container_issue 3
container_start_page 272
container_title Applied physics letters
container_volume 47
creator SCHACHTER, R
OLEGO, D. J
BAUMANN, J. A
BUNZ, L. A
RACCAH, P. M
SPICER, W. E
description We are reporting on a large reduction in the density of states on the InP surface by a phosphorus overlayer. Phosphorus, which is deposited at low temperatures, is a high-resistivity amorphous semiconductor that provides chemical and physical continuity at the interface. The density of surface states, extracted from capacitance-voltage data on metal-insulator-capacitor diodes, is ∼1011/cm2 eV at 0.1 eV below the conduction-band minimum. The low density of states near the conduction band is interpreted as a reduction of phosphorus vacancies at the P-InP interface.
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subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Exact sciences and technology
Physics
Surface and interface electron states
title Interfacial properties of InP and phosphorus deposited at low temperature
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