Repair of clear X-ray mask defects by laser-induced metal deposition
The repair of clear defects on X-ray masks requires the deposition of well-localized high quality films with high aspect ratios. Laser-induced material deposition of heavy metals is one of the alternatives to meet these requirements. Experiments were performed to decide if pyrolytic or photolytic de...
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| Veröffentlicht in: | Microelectronic engineering 1987, Vol.6 (1), p.623-628 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | The repair of clear defects on X-ray masks requires the deposition of well-localized high quality films with high aspect ratios. Laser-induced material deposition of heavy metals is one of the alternatives to meet these requirements. Experiments were performed to decide if pyrolytic or photolytic deposition is more favourable for X-ray mask repair. Deposits of various materials (especially of W, Au, and Sn) on Si membranes were investigated with respect to their X-ray opacity. |
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| ISSN: | 0167-9317 1873-5568 |
| DOI: | 10.1016/0167-9317(87)90097-9 |