In situ observation of fast surface dynamics during the vapor-deposition of a stable organic glass
By measuring the increments of dielectric capacitance (ΔC) and dissipation (Δtan δ) during physical vapor deposition of a 110 nm film of a molecular glass former, we provide direct evidence of the mobile surface layer that is made responsible for the extraordinary properties of vapor deposited glass...
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| Veröffentlicht in: | Soft matter 2020-12, Vol.16 (48), p.10860-10864 |
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| container_title | Soft matter |
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| creator | Thoms, E Gabriel, J P Guiseppi-Elie, A Ediger, M D Richert, R |
| description | By measuring the increments of dielectric capacitance (ΔC) and dissipation (Δtan δ) during physical vapor deposition of a 110 nm film of a molecular glass former, we provide direct evidence of the mobile surface layer that is made responsible for the extraordinary properties of vapor deposited glasses. Depositing at a rate of 0.1 nm s
onto a substrate at T
= 75 K = 0.82T
, we observe a 2.5 nm thick surface layer with an average relaxation time of 0.1 s, while the glass growing underneath has a high kinetic stability. The level of Δtan δ continues to decrease for thousands of seconds after terminating the deposition process, indicating a slow aging-like increase in packing density near the surface. At very low deposition temperatures, 32 and 42 K, the surface layer thicknesses and mobilities are reduced, as are the kinetic stabilities. |
| doi_str_mv | 10.1039/d0sm01916j |
| format | Article |
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onto a substrate at T
= 75 K = 0.82T
, we observe a 2.5 nm thick surface layer with an average relaxation time of 0.1 s, while the glass growing underneath has a high kinetic stability. The level of Δtan δ continues to decrease for thousands of seconds after terminating the deposition process, indicating a slow aging-like increase in packing density near the surface. At very low deposition temperatures, 32 and 42 K, the surface layer thicknesses and mobilities are reduced, as are the kinetic stabilities.</description><identifier>ISSN: 1744-683X</identifier><identifier>EISSN: 1744-6848</identifier><identifier>DOI: 10.1039/d0sm01916j</identifier><identifier>PMID: 33242316</identifier><language>eng</language><publisher>England: Royal Society of Chemistry</publisher><subject>Aging ; Capacitance ; Packing density ; Physical vapor deposition ; Relaxation time ; Substrates ; Surface dynamics ; Surface layers ; Thickness ; Vapors</subject><ispartof>Soft matter, 2020-12, Vol.16 (48), p.10860-10864</ispartof><rights>Copyright Royal Society of Chemistry 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c393t-832d2c30e87c8c7e568f81c3a12d7212a2b1f3baee91447c614b9dbedea4cdbe3</citedby><cites>FETCH-LOGICAL-c393t-832d2c30e87c8c7e568f81c3a12d7212a2b1f3baee91447c614b9dbedea4cdbe3</cites><orcidid>0000-0001-8503-3175 ; 0000-0002-2215-9974 ; 0000-0003-3218-9285 ; 0000-0003-4715-8473 ; 0000-0001-7478-6366</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/33242316$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Thoms, E</creatorcontrib><creatorcontrib>Gabriel, J P</creatorcontrib><creatorcontrib>Guiseppi-Elie, A</creatorcontrib><creatorcontrib>Ediger, M D</creatorcontrib><creatorcontrib>Richert, R</creatorcontrib><title>In situ observation of fast surface dynamics during the vapor-deposition of a stable organic glass</title><title>Soft matter</title><addtitle>Soft Matter</addtitle><description>By measuring the increments of dielectric capacitance (ΔC) and dissipation (Δtan δ) during physical vapor deposition of a 110 nm film of a molecular glass former, we provide direct evidence of the mobile surface layer that is made responsible for the extraordinary properties of vapor deposited glasses. Depositing at a rate of 0.1 nm s
onto a substrate at T
= 75 K = 0.82T
, we observe a 2.5 nm thick surface layer with an average relaxation time of 0.1 s, while the glass growing underneath has a high kinetic stability. The level of Δtan δ continues to decrease for thousands of seconds after terminating the deposition process, indicating a slow aging-like increase in packing density near the surface. At very low deposition temperatures, 32 and 42 K, the surface layer thicknesses and mobilities are reduced, as are the kinetic stabilities.</description><subject>Aging</subject><subject>Capacitance</subject><subject>Packing density</subject><subject>Physical vapor deposition</subject><subject>Relaxation time</subject><subject>Substrates</subject><subject>Surface dynamics</subject><subject>Surface layers</subject><subject>Thickness</subject><subject>Vapors</subject><issn>1744-683X</issn><issn>1744-6848</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNpdkEtLw0AUhQdRbK1u_AEy4EaE6LyaTJZSX5WKCxXchcnMTU1JMnVuUui_N9rahatzF985XD5CTjm74kym145hzXjK48UeGfJEqSjWSu_vbvkxIEeIC8akVjw-JAMphRKSx0OSTxuKZdtRnyOElWlL31Bf0MJgS7ELhbFA3boxdWmRui6UzZy2n0BXZulD5GDp-_q2ZCi2Jq-A-jA3TWnpvDKIx-SgMBXCyTZH5P3-7m3yGM1eHqaTm1lkZSrbSEvhhJUMdGK1TWAc60JzKw0XLhFcGJHzQuYGIOVKJTbmKk9dDg6Msn3KEbnY7C6D_-oA26wu0UJVmQZ8h5lQ8VgpznXao-f_0IXvQtN_11OJSJNYj8c9dbmhbPCIAYpsGcrahHXGWfZjPrtlr8-_5p96-Gw72eU1uB36p1p-A0CIf0I</recordid><startdate>20201228</startdate><enddate>20201228</enddate><creator>Thoms, E</creator><creator>Gabriel, J P</creator><creator>Guiseppi-Elie, A</creator><creator>Ediger, M D</creator><creator>Richert, R</creator><general>Royal Society of Chemistry</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QO</scope><scope>7QQ</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7TA</scope><scope>7TB</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>H8D</scope><scope>H8G</scope><scope>JG9</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>P64</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0001-8503-3175</orcidid><orcidid>https://orcid.org/0000-0002-2215-9974</orcidid><orcidid>https://orcid.org/0000-0003-3218-9285</orcidid><orcidid>https://orcid.org/0000-0003-4715-8473</orcidid><orcidid>https://orcid.org/0000-0001-7478-6366</orcidid></search><sort><creationdate>20201228</creationdate><title>In situ observation of fast surface dynamics during the vapor-deposition of a stable organic glass</title><author>Thoms, E ; 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Depositing at a rate of 0.1 nm s
onto a substrate at T
= 75 K = 0.82T
, we observe a 2.5 nm thick surface layer with an average relaxation time of 0.1 s, while the glass growing underneath has a high kinetic stability. The level of Δtan δ continues to decrease for thousands of seconds after terminating the deposition process, indicating a slow aging-like increase in packing density near the surface. At very low deposition temperatures, 32 and 42 K, the surface layer thicknesses and mobilities are reduced, as are the kinetic stabilities.</abstract><cop>England</cop><pub>Royal Society of Chemistry</pub><pmid>33242316</pmid><doi>10.1039/d0sm01916j</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0001-8503-3175</orcidid><orcidid>https://orcid.org/0000-0002-2215-9974</orcidid><orcidid>https://orcid.org/0000-0003-3218-9285</orcidid><orcidid>https://orcid.org/0000-0003-4715-8473</orcidid><orcidid>https://orcid.org/0000-0001-7478-6366</orcidid></addata></record> |
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| source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
| subjects | Aging Capacitance Packing density Physical vapor deposition Relaxation time Substrates Surface dynamics Surface layers Thickness Vapors |
| title | In situ observation of fast surface dynamics during the vapor-deposition of a stable organic glass |
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