Multi-Processor Control of the 100 KeV McMaster Mark IV Sputter Ion Source

An ion source control system has been developed to provide 100 KeV heavy ion injection into the McMaster FN Tandem. The control system is composed of a CMOS RCA1802 microprocessor at deck potential which conveys power supply command/status data from/to a PDP-11/23 via fibre optic link. Approximately...

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Veröffentlicht in:	IEEE transactions on nuclear science 1985-01, Vol.32 (5), p.2083-2085
Hauptverfasser:	Poehlman, W. F. S., Pollock, R. J., McNaught, R. A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Control systems Fiber optics Ion sources Microprocessors Optical control Plasma displays Power supplies Printers Shafts Voltage control
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