High T(c) superconducting NbN films deposited at room temperature

The dc reactive magnetron sputtering process yields stoichiometric NbN films with superconducting transition temperature T(c) as high as 15.7 K on substrates as varied as glass, glazed ceramic, fused quartz, and sapphire. These films posses fcc (B1) structure and (111) texture. The most dominant fac...

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Veröffentlicht in:Journal of applied physics 1985-12, Vol.58, p.4643-4648
Hauptverfasser: Thakoor, S., Lamb, J. L., Thakoor, A. P., Khanna, S. K.
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container_issue
container_start_page 4643
container_title Journal of applied physics
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creator Thakoor, S.
Lamb, J. L.
Thakoor, A. P.
Khanna, S. K.
description The dc reactive magnetron sputtering process yields stoichiometric NbN films with superconducting transition temperature T(c) as high as 15.7 K on substrates as varied as glass, glazed ceramic, fused quartz, and sapphire. These films posses fcc (B1) structure and (111) texture. The most dominant factors governing the formation of the transition metal nitrides are the relative metal and nitrogen fluxes incident on the substrate and the background argon pressure (which dictates the overall reactive sites and residence times for nitrogen).
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source AIP Digital Archive; NASA Technical Reports Server
subjects Solid-State Physics
title High T(c) superconducting NbN films deposited at room temperature
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