The effect of metal work function on current conduction in metal-insulator-semiconductor tunnel junctions
The effect of metal work function on current conduction in metal-insulator-semiconductor (MIS) tunnel junctions has been investigated both experimentally and theoretically. MIS junctions on 2 and 10 Ω cm silicon substrates have been fabricated with both aluminum and magnesium contacts. It is shown t...
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Veröffentlicht in: | Journal of applied physics 1985-01, Vol.57 (2), p.373-376 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The effect of metal work function on current conduction in metal-insulator-semiconductor (MIS) tunnel junctions has been investigated both experimentally and theoretically. MIS junctions on 2 and 10 Ω cm silicon substrates have been fabricated with both aluminum and magnesium contacts. It is shown that in the region of tunnel-limited current conduction, device characteristics are dependent on the metal work function. The results are in good agreement with predictions from a comprehensive analytical model. The implication of this result for MIS-inversion layer solar cells, where contact current densities are much larger than in transparent metal MIS devices, is examined. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.334761 |