Direct measurement of the energy distribution of hot electrons in silicon dioxide
The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, cont...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 1985-01, Vol.58 (3), p.1302-1313 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!