Direct measurement of the energy distribution of hot electrons in silicon dioxide

The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, cont...

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Veröffentlicht in:Journal of applied physics 1985-01, Vol.58 (3), p.1302-1313
Hauptverfasser: BRORSON, S. D, DIMARIA, D. J, FISCHETTI, M. V, PESAVENTO, F. L, SOLOMON, P. M, DONG, D. W
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container_end_page 1313
container_issue 3
container_start_page 1302
container_title Journal of applied physics
container_volume 58
creator BRORSON, S. D
DIMARIA, D. J
FISCHETTI, M. V
PESAVENTO, F. L
SOLOMON, P. M
DONG, D. W
description The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, contrary to previous theoretical expectations, the majority of carriers in the distribution remains stable at all fields. The results are in agreement with other recent experiments (electroluminescence and carrier separation) which only measure the average energy of hot electrons in SiO2 and with recent Monte Carlo transport calculations which include scattering by both optical and acoustic phonon modes. Results for varying SiO2 thickness, metal gate thickness, oxide composition, and metal gate composition will be discussed.
doi_str_mv 10.1063/1.336098
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subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Conductivity phenomena in semiconductors and insulators
Electronic transport in condensed matter
Exact sciences and technology
High-field and nonlinear effects
Physics
title Direct measurement of the energy distribution of hot electrons in silicon dioxide
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