Direct measurement of the energy distribution of hot electrons in silicon dioxide
The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, cont...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 1985-01, Vol.58 (3), p.1302-1313 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 1313 |
---|---|
container_issue | 3 |
container_start_page | 1302 |
container_title | Journal of applied physics |
container_volume | 58 |
creator | BRORSON, S. D DIMARIA, D. J FISCHETTI, M. V PESAVENTO, F. L SOLOMON, P. M DONG, D. W |
description | The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, contrary to previous theoretical expectations, the majority of carriers in the distribution remains stable at all fields. The results are in agreement with other recent experiments (electroluminescence and carrier separation) which only measure the average energy of hot electrons in SiO2 and with recent Monte Carlo transport calculations which include scattering by both optical and acoustic phonon modes. Results for varying SiO2 thickness, metal gate thickness, oxide composition, and metal gate composition will be discussed. |
doi_str_mv | 10.1063/1.336098 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_24553160</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>24553160</sourcerecordid><originalsourceid>FETCH-LOGICAL-c353t-4fd3335049710bbd4f22afb81b00fb0333d5eab62d7660f71b814ff9faea206b3</originalsourceid><addsrcrecordid>eNo9kF1LwzAYhYMoOKfgT8iFiDedb5qmbS5lzg8YiKDXJWneuEjbzCQF9-_t2PDqXDzPOReHkGsGCwYlv2cLzkuQ9QmZMahlVgkBp2QGkLOslpU8JxcxfgMwVnM5I--PLmCbaI8qjgF7HBL1lqYNUhwwfO2ocTEFp8fk_LBHG58odlMn-CFSN9DoOtdOzDj_6wxekjOruohXx5yTz6fVx_IlW789vy4f1lnLBU9ZYQ3nXEAhKwZam8LmubK6ZhrAapiYEah0mZuqLMFWbEKFtdIqVDmUms_J7WF3G_zPiDE1vYstdp0a0I-xyQshOCthEu8OYht8jAFtsw2uV2HXMGj2nzWsOXw2qTfHTRVb1dmghtbFf78WPJeC8z_EKmtr</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>24553160</pqid></control><display><type>article</type><title>Direct measurement of the energy distribution of hot electrons in silicon dioxide</title><source>AIP Digital Archive</source><creator>BRORSON, S. D ; DIMARIA, D. J ; FISCHETTI, M. V ; PESAVENTO, F. L ; SOLOMON, P. M ; DONG, D. W</creator><creatorcontrib>BRORSON, S. D ; DIMARIA, D. J ; FISCHETTI, M. V ; PESAVENTO, F. L ; SOLOMON, P. M ; DONG, D. W</creatorcontrib><description>The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, contrary to previous theoretical expectations, the majority of carriers in the distribution remains stable at all fields. The results are in agreement with other recent experiments (electroluminescence and carrier separation) which only measure the average energy of hot electrons in SiO2 and with recent Monte Carlo transport calculations which include scattering by both optical and acoustic phonon modes. Results for varying SiO2 thickness, metal gate thickness, oxide composition, and metal gate composition will be discussed.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.336098</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Conductivity phenomena in semiconductors and insulators ; Electronic transport in condensed matter ; Exact sciences and technology ; High-field and nonlinear effects ; Physics</subject><ispartof>Journal of applied physics, 1985-01, Vol.58 (3), p.1302-1313</ispartof><rights>1986 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c353t-4fd3335049710bbd4f22afb81b00fb0333d5eab62d7660f71b814ff9faea206b3</citedby><cites>FETCH-LOGICAL-c353t-4fd3335049710bbd4f22afb81b00fb0333d5eab62d7660f71b814ff9faea206b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8532953$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>BRORSON, S. D</creatorcontrib><creatorcontrib>DIMARIA, D. J</creatorcontrib><creatorcontrib>FISCHETTI, M. V</creatorcontrib><creatorcontrib>PESAVENTO, F. L</creatorcontrib><creatorcontrib>SOLOMON, P. M</creatorcontrib><creatorcontrib>DONG, D. W</creatorcontrib><title>Direct measurement of the energy distribution of hot electrons in silicon dioxide</title><title>Journal of applied physics</title><description>The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, contrary to previous theoretical expectations, the majority of carriers in the distribution remains stable at all fields. The results are in agreement with other recent experiments (electroluminescence and carrier separation) which only measure the average energy of hot electrons in SiO2 and with recent Monte Carlo transport calculations which include scattering by both optical and acoustic phonon modes. Results for varying SiO2 thickness, metal gate thickness, oxide composition, and metal gate composition will be discussed.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Conductivity phenomena in semiconductors and insulators</subject><subject>Electronic transport in condensed matter</subject><subject>Exact sciences and technology</subject><subject>High-field and nonlinear effects</subject><subject>Physics</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1985</creationdate><recordtype>article</recordtype><recordid>eNo9kF1LwzAYhYMoOKfgT8iFiDedb5qmbS5lzg8YiKDXJWneuEjbzCQF9-_t2PDqXDzPOReHkGsGCwYlv2cLzkuQ9QmZMahlVgkBp2QGkLOslpU8JxcxfgMwVnM5I--PLmCbaI8qjgF7HBL1lqYNUhwwfO2ocTEFp8fk_LBHG58odlMn-CFSN9DoOtdOzDj_6wxekjOruohXx5yTz6fVx_IlW789vy4f1lnLBU9ZYQ3nXEAhKwZam8LmubK6ZhrAapiYEah0mZuqLMFWbEKFtdIqVDmUms_J7WF3G_zPiDE1vYstdp0a0I-xyQshOCthEu8OYht8jAFtsw2uV2HXMGj2nzWsOXw2qTfHTRVb1dmghtbFf78WPJeC8z_EKmtr</recordid><startdate>19850101</startdate><enddate>19850101</enddate><creator>BRORSON, S. D</creator><creator>DIMARIA, D. J</creator><creator>FISCHETTI, M. V</creator><creator>PESAVENTO, F. L</creator><creator>SOLOMON, P. M</creator><creator>DONG, D. W</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19850101</creationdate><title>Direct measurement of the energy distribution of hot electrons in silicon dioxide</title><author>BRORSON, S. D ; DIMARIA, D. J ; FISCHETTI, M. V ; PESAVENTO, F. L ; SOLOMON, P. M ; DONG, D. W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c353t-4fd3335049710bbd4f22afb81b00fb0333d5eab62d7660f71b814ff9faea206b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1985</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Conductivity phenomena in semiconductors and insulators</topic><topic>Electronic transport in condensed matter</topic><topic>Exact sciences and technology</topic><topic>High-field and nonlinear effects</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>BRORSON, S. D</creatorcontrib><creatorcontrib>DIMARIA, D. J</creatorcontrib><creatorcontrib>FISCHETTI, M. V</creatorcontrib><creatorcontrib>PESAVENTO, F. L</creatorcontrib><creatorcontrib>SOLOMON, P. M</creatorcontrib><creatorcontrib>DONG, D. W</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>BRORSON, S. D</au><au>DIMARIA, D. J</au><au>FISCHETTI, M. V</au><au>PESAVENTO, F. L</au><au>SOLOMON, P. M</au><au>DONG, D. W</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Direct measurement of the energy distribution of hot electrons in silicon dioxide</atitle><jtitle>Journal of applied physics</jtitle><date>1985-01-01</date><risdate>1985</risdate><volume>58</volume><issue>3</issue><spage>1302</spage><epage>1313</epage><pages>1302-1313</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>The energy distribution of hot electrons in high-field stressed amorphous silicon dioxide (SiO2) films have been measured using a vacuum emission technique. Electrons having average energies ≳2 eV and an energy relaxation length of λ≊32 Å are observed at all fields studied (≳ 2 MV/cm). However, contrary to previous theoretical expectations, the majority of carriers in the distribution remains stable at all fields. The results are in agreement with other recent experiments (electroluminescence and carrier separation) which only measure the average energy of hot electrons in SiO2 and with recent Monte Carlo transport calculations which include scattering by both optical and acoustic phonon modes. Results for varying SiO2 thickness, metal gate thickness, oxide composition, and metal gate composition will be discussed.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.336098</doi><tpages>12</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-8979 |
ispartof | Journal of applied physics, 1985-01, Vol.58 (3), p.1302-1313 |
issn | 0021-8979 1089-7550 |
language | eng |
recordid | cdi_proquest_miscellaneous_24553160 |
source | AIP Digital Archive |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Conductivity phenomena in semiconductors and insulators Electronic transport in condensed matter Exact sciences and technology High-field and nonlinear effects Physics |
title | Direct measurement of the energy distribution of hot electrons in silicon dioxide |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T10%3A26%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Direct%20measurement%20of%20the%20energy%20distribution%20of%20hot%20electrons%20in%20silicon%20dioxide&rft.jtitle=Journal%20of%20applied%20physics&rft.au=BRORSON,%20S.%20D&rft.date=1985-01-01&rft.volume=58&rft.issue=3&rft.spage=1302&rft.epage=1313&rft.pages=1302-1313&rft.issn=0021-8979&rft.eissn=1089-7550&rft.coden=JAPIAU&rft_id=info:doi/10.1063/1.336098&rft_dat=%3Cproquest_cross%3E24553160%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=24553160&rft_id=info:pmid/&rfr_iscdi=true |