Stacked thin-film photoelectrode using iron oxide

Stacked thin-film photoelectrode using iron oxide

For photoanodes of materials with low mobilities it is advantageous to use several layers of thickness less than the space-charge region, thereby decreasing recombination. To compensate losses due to lack of absorption, several layers should be placed successively in the light path. Some experimenta...

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Veröffentlicht in:Journal of applied physics 1984-01, Vol.56 (3), p.874-876
Hauptverfasser: ITOH, K, BOCKRIS, J. O.-M
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Sprache:eng
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Applied sciences
Energy
Exact sciences and technology
Natural energy
Solar energy
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container_title Journal of applied physics
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creator ITOH, K
BOCKRIS, J. O.-M
description For photoanodes of materials with low mobilities it is advantageous to use several layers of thickness less than the space-charge region, thereby decreasing recombination. To compensate losses due to lack of absorption, several layers should be placed successively in the light path. Some experimental verification is described.
doi_str_mv 10.1063/1.334028
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1089-7550
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subjects Applied sciences
Energy
Exact sciences and technology
Natural energy
Solar energy
title Stacked thin-film photoelectrode using iron oxide
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