Excimer lasers as deep UV sources for photolithographic system
Excimer lasers as deep UV sources will extend optical lithography to sub-micron linewidths providing the appropriate optics can be designed and constructed and the necessary resist technology developed. This paper discusses the basic properties of excimer lasers and the overall design concepts of op...
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| Veröffentlicht in: | Microelectronic engineering 1986, Vol.5 (1), p.445-452 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Excimer lasers as deep UV sources will extend optical lithography to sub-micron linewidths providing the appropriate optics can be designed and constructed and the necessary resist technology developed. This paper discusses the basic properties of excimer lasers and the overall design concepts of optical systems. A projection system based upon a KrF excimer laser and the Wynne- Dyson 1:1 optics is described. |
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| ISSN: | 0167-9317 1873-5568 |
| DOI: | 10.1016/0167-9317(86)90075-4 |