Monolayer surface doping of GaAs from a plated zinc source

We have investigated surface doping and diffusion of Zn in GaAs using rapid thermal processing. The use of an aqueous RuCl3 pretreatment has enabled us to electroplate uniform ≊100-Å-thick Zn layers directly on the GaAs surface. The excess Zn is removed with a 500 °C vacuum ‘‘evaporation,’’ leaving...

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Veröffentlicht in:Applied physics letters 1984-01, Vol.44 (9), p.884-886
Hauptverfasser: DOPKIN, D. M, GIBBONS, J. F
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creator DOPKIN, D. M
GIBBONS, J. F
description We have investigated surface doping and diffusion of Zn in GaAs using rapid thermal processing. The use of an aqueous RuCl3 pretreatment has enabled us to electroplate uniform ≊100-Å-thick Zn layers directly on the GaAs surface. The excess Zn is removed with a 500 °C vacuum ‘‘evaporation,’’ leaving a modified surface layer which may serve as a dopant source for rapid thermal diffusion. Evaporation of A1 onto such surfaces yields Schottky diodes with enhanced barrier heights which have been used to fabricate metal-semiconductor field-effect transistor structures.
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ispartof Applied physics letters, 1984-01, Vol.44 (9), p.884-886
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1077-3118
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subjects Condensed matter: structure, mechanical and thermal properties
Defects and impurities in crystals
microstructure
Doping and impurity implantation in iii-v and ii-vi semiconductors
Exact sciences and technology
Physics
Structure of solids and liquids
crystallography
title Monolayer surface doping of GaAs from a plated zinc source
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