Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

Based on investigations on the reactive deposition of oxides and nitrides a review is given of the most important process parameters of reactive d.c. high rate sputtering. Knowledge of the possibilities to ensure a stable and reproducible regime is essential for the use of reactive d.c. plasmatron s...

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Veröffentlicht in:Thin solid films 1984-01, Vol.118 (3), p.255-270
Hauptverfasser: Schiller, S., Heisig, U., Beister, G., Steinfelder, K., Strümpfel, J., Korndörfer, Chr, Sieber, W.
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container_end_page 270
container_issue 3
container_start_page 255
container_title Thin solid films
container_volume 118
creator Schiller, S.
Heisig, U.
Beister, G.
Steinfelder, K.
Strümpfel, J.
Korndörfer, Chr
Sieber, W.
description Based on investigations on the reactive deposition of oxides and nitrides a review is given of the most important process parameters of reactive d.c. high rate sputtering. Knowledge of the possibilities to ensure a stable and reproducible regime is essential for the use of reactive d.c. plasmatron sputtering. Technical solutions are presented that use the principles of plasma emission spectroscopy. Also dealt with are oxides of CrSi and aluminium for use as wear-resistant coatings because they can be deposited in a self-stabilizing regime. Of particular interest is the production of TiN x layers for various applications, especially to enhance the lifetime or productivity of cutting tools made from high speed steel. Hence the relationship between the process parameters and the properties of these coatings is outlined in more detail.
doi_str_mv 10.1016/0040-6090(84)90196-2
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title Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering
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