Generation of soft x rays using a rare gas-hydrogen plasma focus and its application to x-ray lithography

A conventional plasma focus device was used to produce a hot, dense plasma which emits radiation strongly in the soft x-ray region. We showed experimentally that a plasma produced from a mixture of hydrogen and a rare gas such as neon, argon, or krypton is an effective source of a characteristic x r...

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Veröffentlicht in:	Applied physics letters 1986-03, Vol.48 (11), p.686-688
Hauptverfasser:	KATO, Y, BE, S. H
Format:	Artikel
Sprache:	eng
Schlagworte:	Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma devices
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container_title	Applied physics letters
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description	A conventional plasma focus device was used to produce a hot, dense plasma which emits radiation strongly in the soft x-ray region. We showed experimentally that a plasma produced from a mixture of hydrogen and a rare gas such as neon, argon, or krypton is an effective source of a characteristic x ray of the rare gas. Resist exposures and pattern printings were made to evaluate the feasibility of this device as a source for soft x-ray lithography.
doi_str_mv	10.1063/1.96743
format	Article
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ispartof	Applied physics letters, 1986-03, Vol.48 (11), p.686-688
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language	eng
recordid	cdi_proquest_miscellaneous_24074944
source	AIP Digital Archive
subjects	Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma devices
title	Generation of soft x rays using a rare gas-hydrogen plasma focus and its application to x-ray lithography
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