Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation

Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs...

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Veröffentlicht in:	Optics letters 2020-04, Vol.45 (8), p.2435-2438
Hauptverfasser:	Mikami, Katsuhiro, Ishino, Masahiko, Dinh, Thanh-Hung, Motokoshi, Shinji, Hasegawa, Noboru, Kon, Akira, Inubushi, Yuichi, Owada, Shigeki, Kinoshita, Hiroo, Nishikino, Masaharu
Format:	Artikel
Sprache:	eng
Schlagworte:	Cleavage Femtosecond pulses Free electron lasers Hydroxyl groups Laser damage Lasers Photoionization Radiation damage Silica glass Silicon dioxide Soft x rays Spallation Thresholds X ray lasers
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