Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation
Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs...
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| Veröffentlicht in: | Optics letters 2020-04, Vol.45 (8), p.2435-2438 |
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| creator | Mikami, Katsuhiro Ishino, Masahiko Dinh, Thanh-Hung Motokoshi, Shinji Hasegawa, Noboru Kon, Akira Inubushi, Yuichi Owada, Shigeki Kinoshita, Hiroo Nishikino, Masaharu |
| description | Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings. |
| doi_str_mv | 10.1364/ol.389288 |
| format | Article |
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The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings.</description><identifier>ISSN: 0146-9592</identifier><identifier>EISSN: 1539-4794</identifier><identifier>DOI: 10.1364/ol.389288</identifier><identifier>PMID: 32287252</identifier><language>eng</language><publisher>United States: Optical Society of America</publisher><subject>Cleavage ; Femtosecond pulses ; Free electron lasers ; Hydroxyl groups ; Laser damage ; Lasers ; Photoionization ; Radiation damage ; Silica glass ; Silicon dioxide ; Soft x rays ; Spallation ; Thresholds ; X ray lasers</subject><ispartof>Optics letters, 2020-04, Vol.45 (8), p.2435-2438</ispartof><rights>Copyright Optical Society of America Apr 15, 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c423t-44eca1e48f75206abbd4e8bd2bc901923e038f2a4be121b464d9081d7e4d1c5a3</citedby><cites>FETCH-LOGICAL-c423t-44eca1e48f75206abbd4e8bd2bc901923e038f2a4be121b464d9081d7e4d1c5a3</cites><orcidid>0000-0002-6505-0661</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,3258,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/32287252$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Mikami, Katsuhiro</creatorcontrib><creatorcontrib>Ishino, Masahiko</creatorcontrib><creatorcontrib>Dinh, Thanh-Hung</creatorcontrib><creatorcontrib>Motokoshi, Shinji</creatorcontrib><creatorcontrib>Hasegawa, Noboru</creatorcontrib><creatorcontrib>Kon, Akira</creatorcontrib><creatorcontrib>Inubushi, Yuichi</creatorcontrib><creatorcontrib>Owada, Shigeki</creatorcontrib><creatorcontrib>Kinoshita, Hiroo</creatorcontrib><creatorcontrib>Nishikino, Masaharu</creatorcontrib><title>Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation</title><title>Optics letters</title><addtitle>Opt Lett</addtitle><description>Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings.</description><subject>Cleavage</subject><subject>Femtosecond pulses</subject><subject>Free electron lasers</subject><subject>Hydroxyl groups</subject><subject>Laser damage</subject><subject>Lasers</subject><subject>Photoionization</subject><subject>Radiation damage</subject><subject>Silica glass</subject><subject>Silicon dioxide</subject><subject>Soft x rays</subject><subject>Spallation</subject><subject>Thresholds</subject><subject>X ray lasers</subject><issn>0146-9592</issn><issn>1539-4794</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNpdkU1P4zAQhq0VaCnsHvgDyBIXOIT1VxL7iCq-pEpcds_RxJ60Rk5c7ETQf7-pChy4zEij5300miHknLMbLiv1J4YbqY3Q-gdZ8FKaQtVGHZEF46oqTGnECTnN-YUxVtVS_iQnUghdi1IsyNsKMqbCD26y6KiDHtZIx03CvInBZQqDoz3aDQw-9zR2NPvgLdB1gJzpZ67d0SmMCYo5lUaaYzfS9yLBjoa9n26nkJH6lMB5GH0cfpHjDubZ749-Rv7d3_1dPhar54en5e2qsErIsVAKLXBUuqtLwSpoW6dQt0601jBuhEQmdSdAtcgFb1WlnGGauxqV47YEeUauDt5tiq8T5rHpfbYYAgwYp9wIOXvKuYoZvfyGvsQpDfN2jVBcaWVqyWfq-kDZFHNO2DXb5HtIu4azZv-N5nnVHL4xsxcfxqnt0X2Rn-eX_wG8VoWr</recordid><startdate>20200415</startdate><enddate>20200415</enddate><creator>Mikami, Katsuhiro</creator><creator>Ishino, Masahiko</creator><creator>Dinh, Thanh-Hung</creator><creator>Motokoshi, Shinji</creator><creator>Hasegawa, Noboru</creator><creator>Kon, Akira</creator><creator>Inubushi, Yuichi</creator><creator>Owada, Shigeki</creator><creator>Kinoshita, Hiroo</creator><creator>Nishikino, Masaharu</creator><general>Optical Society of America</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0002-6505-0661</orcidid></search><sort><creationdate>20200415</creationdate><title>Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation</title><author>Mikami, Katsuhiro ; Ishino, Masahiko ; Dinh, Thanh-Hung ; Motokoshi, Shinji ; Hasegawa, Noboru ; Kon, Akira ; Inubushi, Yuichi ; Owada, Shigeki ; Kinoshita, Hiroo ; Nishikino, Masaharu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c423t-44eca1e48f75206abbd4e8bd2bc901923e038f2a4be121b464d9081d7e4d1c5a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Cleavage</topic><topic>Femtosecond pulses</topic><topic>Free electron lasers</topic><topic>Hydroxyl groups</topic><topic>Laser damage</topic><topic>Lasers</topic><topic>Photoionization</topic><topic>Radiation damage</topic><topic>Silica glass</topic><topic>Silicon dioxide</topic><topic>Soft x rays</topic><topic>Spallation</topic><topic>Thresholds</topic><topic>X ray lasers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mikami, Katsuhiro</creatorcontrib><creatorcontrib>Ishino, Masahiko</creatorcontrib><creatorcontrib>Dinh, Thanh-Hung</creatorcontrib><creatorcontrib>Motokoshi, Shinji</creatorcontrib><creatorcontrib>Hasegawa, Noboru</creatorcontrib><creatorcontrib>Kon, Akira</creatorcontrib><creatorcontrib>Inubushi, Yuichi</creatorcontrib><creatorcontrib>Owada, Shigeki</creatorcontrib><creatorcontrib>Kinoshita, Hiroo</creatorcontrib><creatorcontrib>Nishikino, Masaharu</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>MEDLINE - Academic</collection><jtitle>Optics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mikami, Katsuhiro</au><au>Ishino, Masahiko</au><au>Dinh, Thanh-Hung</au><au>Motokoshi, Shinji</au><au>Hasegawa, Noboru</au><au>Kon, Akira</au><au>Inubushi, Yuichi</au><au>Owada, Shigeki</au><au>Kinoshita, Hiroo</au><au>Nishikino, Masaharu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2020-04-15</date><risdate>2020</risdate><volume>45</volume><issue>8</issue><spage>2435</spage><epage>2438</epage><pages>2435-2438</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><abstract>Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings.</abstract><cop>United States</cop><pub>Optical Society of America</pub><pmid>32287252</pmid><doi>10.1364/ol.389288</doi><tpages>4</tpages><orcidid>https://orcid.org/0000-0002-6505-0661</orcidid></addata></record> |
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| source | Optica Publishing Group Journals |
| subjects | Cleavage Femtosecond pulses Free electron lasers Hydroxyl groups Laser damage Lasers Photoionization Radiation damage Silica glass Silicon dioxide Soft x rays Spallation Thresholds X ray lasers |
| title | Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation |
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