Diffusion and structural relaxation in compositionally modulated amorphous metal films

The interdiffusivity in compositionally modulated (λ≈25 Å) amorphous (Pd85Si15)61/(Fe85B15)89 and (Pd80Au7Si13)70/Fe30 films has been measured by monitoring the satellite of the (000) x-ray scattering peak during isothermal anneals in the range 210–250 °C. Diffusivities as low as 10−22 cm2 s−1 have...

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Veröffentlicht in:Applied physics letters 1980-07, Vol.37 (2), p.184-186
Hauptverfasser: Rosenblum, M. P., Spaepen, F., Turnbull, D.
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Spaepen, F.
Turnbull, D.
description The interdiffusivity in compositionally modulated (λ≈25 Å) amorphous (Pd85Si15)61/(Fe85B15)89 and (Pd80Au7Si13)70/Fe30 films has been measured by monitoring the satellite of the (000) x-ray scattering peak during isothermal anneals in the range 210–250 °C. Diffusivities as low as 10−22 cm2 s−1 have been measured. It was observed that the diffusivity decreased continuously during the annealing as a result of structural relaxation and settled down to a constant value only after many hours of annealing. The activation energy of the isoconfigurational diffusivity in the Pd-Au-Si/Fe films is 167 kJ mol−1. This value and the time scale of the relaxation are similar to those observed in earlier viscosity measurements, indicating a similarity between the structural defects controlling both transport processes.
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title Diffusion and structural relaxation in compositionally modulated amorphous metal films
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