The effects of thin film homogeneity on the performance of ferroelectric tunnel junctions

The compelling physical properties of the recently discovered ferroelectric phase in thin film Hf Zr O have opened a window for applications such as non-volatile resistive switching memory devices with high retention known as ferroelectric tunnel junctions. In this article, we investigate the stabil...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of physics. Condensed matter 2020-05, Vol.32 (18), p.185302-185302
Hauptverfasser: Dörfler, A, Kolhatkar, G, Wagner, U, Ruediger, A
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!