Sputtering of a polymer layer deposited on metal substrates
Substrates of Be, Si, Cr, and Mo were covered by a 400-nm thin film of the electron lithography resist poly(methyl methacrylate) (PMMA), and irradiated by Ar+ ions. The photon emission from sputtered deexciting particles ejected during the ion bombardment was detected. The spectral scans of observed...
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| Veröffentlicht in: | Journal of applied physics 1983-12, Vol.54 (12), p.7119-7123 |
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| container_end_page | 7123 |
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| container_title | Journal of applied physics |
| container_volume | 54 |
| creator | EMMOTH, B MLADENOV, G. M |
| description | Substrates of Be, Si, Cr, and Mo were covered by a 400-nm thin film of the electron lithography resist poly(methyl methacrylate) (PMMA), and irradiated by Ar+ ions. The photon emission from sputtered deexciting particles ejected during the ion bombardment was detected. The spectral scans of observed photon radiation were different for PMMA on different substrates. This supports our conclusion that excitation and ejection processes are related to the collision cascades and possibly also to collective electronic excitations. The evaluated average sputtering rates for Ar+ bombardment of PMMA at ion energies 30 and 60 keV are 320 and 375 atoms/ion, respectively, or 1.85 and 2.20 Å cm2/μC correspondingly. The erosion mechanism is discussed against this background. |
| doi_str_mv | 10.1063/1.331982 |
| format | Article |
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The erosion mechanism is discussed against this background.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.331982</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>Applied sciences ; Exact sciences and technology ; Physicochemistry of polymers ; Polymers and radiations ; Properties and characterization</subject><ispartof>Journal of applied physics, 1983-12, Vol.54 (12), p.7119-7123</ispartof><rights>1984 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c285t-162f320ef6878e2b2eb506802f0eb3451112f184c5ba8f4d4b8580fee28b2693</citedby><cites>FETCH-LOGICAL-c285t-162f320ef6878e2b2eb506802f0eb3451112f184c5ba8f4d4b8580fee28b2693</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=9630990$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>EMMOTH, B</creatorcontrib><creatorcontrib>MLADENOV, G. 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| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 1983-12, Vol.54 (12), p.7119-7123 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_23381501 |
| source | AIP Digital Archive |
| subjects | Applied sciences Exact sciences and technology Physicochemistry of polymers Polymers and radiations Properties and characterization |
| title | Sputtering of a polymer layer deposited on metal substrates |
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