Azide-phenolic resin photoresists for deep UV lithography

A photosensitive composition, consisting of an aromatic azide compound (3,3'-diazidodiphenyl sulfone) and a phenolic resin (poly(p-vinylphenol)), called MRS-1, has been prepared and evaluated as a negative deep UV resist for high resolution lithography. Solubility of MRS-1 in an aqueous alkalin...

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Veröffentlicht in:	IEEE transactions on electron devices 1981-11, Vol.28 (11), p.1306-1310
Hauptverfasser:	Iwayanagi, T., Kohashi, T., Nonogaki, S., Matsuzawa, T., Douta, K., Yanazawa, H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Absorption Dry etching Lithography Resins Resists Sensitivity
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