Elucidating the restructuring-induced highly active bimetallic Pt-Co/KL catalyst for the aromatization of n-heptane
A bimetallic Pt-Co/KL catalyst was fabricated via the atomic layer deposition (ALD) method and demonstrated to be highly active and stable for the aromatization of n-heptane at a low temperature (420 °C), which is due to the restructured Pt-Co clusters providing unique catalytic sites and the enhanc...
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Veröffentlicht in: | Chemical communications (Cambridge, England) England), 2020-01, Vol.56 (6), p.892-895 |
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container_title | Chemical communications (Cambridge, England) |
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creator | Wang, Shuyuan Xu, Dan Zhu, Di Zhao, Baofeng Guan, Haibin Qin, Yong Wu, Baoshan Yang, Yong Li, Yongwang |
description | A bimetallic Pt-Co/KL catalyst was fabricated via the atomic layer deposition (ALD) method and demonstrated to be highly active and stable for the aromatization of n-heptane at a low temperature (420 °C), which is due to the restructured Pt-Co clusters providing unique catalytic sites and the enhanced electron-donating properties of the catalyst. |
doi_str_mv | 10.1039/c9cc08845h |
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source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
subjects | Atomic layer epitaxy Bimetals Catalysts Cobalt Heptanes Low temperature Platinum |
title | Elucidating the restructuring-induced highly active bimetallic Pt-Co/KL catalyst for the aromatization of n-heptane |
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