Thin-film dye laser with etched cavity

We describe a thin-film laser with a Fabry-Perot cavity. The cavity is chemically etch into a (100) -cut silicon substrate and filled with rhodamine 6G doped polyurethane. Overfilling of the cavity provides the passage for the output. A nitrogen laser serves as pump source.

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Veröffentlicht in:Appl. Phys. Lett.; (United States) 1976-11, Vol.29 (9), p.582-585
Hauptverfasser: Hu, Chenming, Kim, Seihee
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container_title Appl. Phys. Lett.; (United States)
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creator Hu, Chenming
Kim, Seihee
description We describe a thin-film laser with a Fabry-Perot cavity. The cavity is chemically etch into a (100) -cut silicon substrate and filled with rhodamine 6G doped polyurethane. Overfilling of the cavity provides the passage for the output. A nitrogen laser serves as pump source.
doi_str_mv 10.1063/1.89195
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ispartof Appl. Phys. Lett.; (United States), 1976-11, Vol.29 (9), p.582-585
issn 0003-6951
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language eng
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source AIP Digital Archive
subjects AMINES
CARBOXYLIC ACIDS
DYE LASERS
DYES
ELEMENTS
ENERGY
ENGINEERING
HETEROCYCLIC ACIDS
HETEROCYCLIC COMPOUNDS
LASER CAVITIES
LASERS
OPTICAL PUMPING
ORGANIC ACIDS
ORGANIC COMPOUNDS
ORGANIC OXYGEN COMPOUNDS
ORGANIC POLYMERS
PETROCHEMICALS
PETROLEUM PRODUCTS
PLASTICS
POLYAMIDES
POLYMERS
POLYURETHANES
REAGENTS
RHODAMINES
SEMIMETALS 420300 -- Engineering-- Lasers-- (-1989)
SILICON
THRESHOLD ENERGY
WAVEGUIDES
title Thin-film dye laser with etched cavity
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