Improved efficiency of MIS-silicon solar cells by HF treatment of the oxide layer

Low-temperature processes, which can be used for MIS structures, are very applicable for polysilicon solar cells. An HF treatment of the insulating oxide layer in single-crystal MIS-silicon solar cells turned out to enhance the short-circuit current such that the AM1 efficiency appeared to be more t...

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Veröffentlicht in:Appl. Phys. Lett.; (United States) 1976-05, Vol.28 (10), p.620-621
Hauptverfasser: Kipperman, A. H. M., Omar, M. H.
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Sprache:eng
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Zusammenfassung:Low-temperature processes, which can be used for MIS structures, are very applicable for polysilicon solar cells. An HF treatment of the insulating oxide layer in single-crystal MIS-silicon solar cells turned out to enhance the short-circuit current such that the AM1 efficiency appeared to be more than 10% without antireflection coating. A low surface recombination is indicated by the response to the blue part of the solar spectrum.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.88588