High-temperature GaAs single heterojunction laser diodes

GaAs single heterojunction laser diodes were prepared by epitaxially growing all the layers of the structure. The doping in the n -type confining layer and the p -type active layer were varied as was the thickness of the active layer. The effect of these device parameters on the temperature variatio...

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Veröffentlicht in:J. Appl. Phys.; (United States) 1974-10, Vol.45 (10), p.4520-4527
Hauptverfasser: Minden, H T, Premo, R
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description GaAs single heterojunction laser diodes were prepared by epitaxially growing all the layers of the structure. The doping in the n -type confining layer and the p -type active layer were varied as was the thickness of the active layer. The effect of these device parameters on the temperature variation of the threshold current and efficiency was determined. A correlation was observed between an abrupt increase in the threshold current on one hand and the onset of optical pulse delay effects on the other hand. Coincident changes in the spectrum and far-field pattern were also observed. A dielectric slab model is used to explain the experimental results. It is also postulated that there was a strong saturable absorption mechanism associated with the n -type region.
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subjects 420300 - Engineering- Lasers- (-1989)
ARSENIC COMPOUNDS
ARSENIDES
CRYSTAL GROWTH
ENGINEERING
EPITAXY
FABRICATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
title High-temperature GaAs single heterojunction laser diodes
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