Temperature and frequency dependence of exchange anisotropy effects in oxidized NiFe films

Hysteresis loops have been measured for thin NiFe films between 5 and 300 K using the magneto-optic Kerr effect. Films that are free of any surface oxide do not show a displacement of the easy-axis loop along the field axis, and the coercive force and anisotropy field are very weak functions of the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 1972-10, Vol.43 (10), p.4184-4190
Hauptverfasser: Fulcomer, E., Charap, S. H.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 4190
container_issue 10
container_start_page 4184
container_title Journal of applied physics
container_volume 43
creator Fulcomer, E.
Charap, S. H.
description Hysteresis loops have been measured for thin NiFe films between 5 and 300 K using the magneto-optic Kerr effect. Films that are free of any surface oxide do not show a displacement of the easy-axis loop along the field axis, and the coercive force and anisotropy field are very weak functions of the temperature. Oxidized films show striking exchange anisotropy effects; displaced loops appear below a transition temperature ranging from 30 to 90 K as the film is more heavily oxidized. Loop width and anisotropy field increase with decreasing temperature, exhibiting a change in slope in the neighborhood of the transition temperature. The steady-state parameters have characteristic frequency dependences; with increasing frequency the loop displacement and anisotropy field increase and the loop width decreases in the range 0.05–100 Hz. The interpretation of these results in terms of thermal aftereffect taking place in the antiferromagnetic oxide is presented in a companion paper.
doi_str_mv 10.1063/1.1660893
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_21865057</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>21865057</sourcerecordid><originalsourceid>FETCH-LOGICAL-c324t-4df282870530b1d18602b1fa5d0fd86005ad1964e109cdfd3ec44b3c8aba100a3</originalsourceid><addsrcrecordid>eNotkE9LAzEUxIMoWKsHv0FOgoet723271GKVaHopV68hGzyopHdzZpsofXTu6U9zQz8GIZh7BZhgVCIB1xgUUBVizM2w0mTMs_hnM0AUkyquqwv2VWMPwCIlahn7HND3UBBjdtAXPWG20C_W-r1nhsaqDeTJe4tp53-Vv3XAXLRj8EPe07Wkh4jdz33O2fcHxn-5lbErWu7eM0urGoj3Zx0zj5WT5vlS7J-f35dPq4TLdJsTDJj0yqtSsgFNGiwKiBt0KrcgDVTgFwZrIuMEGptrBGks6wRulKNQgAl5uzu2DsEP02Po-xc1NS2qie_jTKdKnPIywm8P4I6-BgDWTkE16mwlwjy8J5EeXpP_APdBGJm</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>21865057</pqid></control><display><type>article</type><title>Temperature and frequency dependence of exchange anisotropy effects in oxidized NiFe films</title><source>AIP Digital Archive</source><creator>Fulcomer, E. ; Charap, S. H.</creator><creatorcontrib>Fulcomer, E. ; Charap, S. H.</creatorcontrib><description>Hysteresis loops have been measured for thin NiFe films between 5 and 300 K using the magneto-optic Kerr effect. Films that are free of any surface oxide do not show a displacement of the easy-axis loop along the field axis, and the coercive force and anisotropy field are very weak functions of the temperature. Oxidized films show striking exchange anisotropy effects; displaced loops appear below a transition temperature ranging from 30 to 90 K as the film is more heavily oxidized. Loop width and anisotropy field increase with decreasing temperature, exhibiting a change in slope in the neighborhood of the transition temperature. The steady-state parameters have characteristic frequency dependences; with increasing frequency the loop displacement and anisotropy field increase and the loop width decreases in the range 0.05–100 Hz. The interpretation of these results in terms of thermal aftereffect taking place in the antiferromagnetic oxide is presented in a companion paper.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.1660893</identifier><language>eng</language><ispartof>Journal of applied physics, 1972-10, Vol.43 (10), p.4184-4190</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c324t-4df282870530b1d18602b1fa5d0fd86005ad1964e109cdfd3ec44b3c8aba100a3</citedby><cites>FETCH-LOGICAL-c324t-4df282870530b1d18602b1fa5d0fd86005ad1964e109cdfd3ec44b3c8aba100a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Fulcomer, E.</creatorcontrib><creatorcontrib>Charap, S. H.</creatorcontrib><title>Temperature and frequency dependence of exchange anisotropy effects in oxidized NiFe films</title><title>Journal of applied physics</title><description>Hysteresis loops have been measured for thin NiFe films between 5 and 300 K using the magneto-optic Kerr effect. Films that are free of any surface oxide do not show a displacement of the easy-axis loop along the field axis, and the coercive force and anisotropy field are very weak functions of the temperature. Oxidized films show striking exchange anisotropy effects; displaced loops appear below a transition temperature ranging from 30 to 90 K as the film is more heavily oxidized. Loop width and anisotropy field increase with decreasing temperature, exhibiting a change in slope in the neighborhood of the transition temperature. The steady-state parameters have characteristic frequency dependences; with increasing frequency the loop displacement and anisotropy field increase and the loop width decreases in the range 0.05–100 Hz. The interpretation of these results in terms of thermal aftereffect taking place in the antiferromagnetic oxide is presented in a companion paper.</description><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1972</creationdate><recordtype>article</recordtype><recordid>eNotkE9LAzEUxIMoWKsHv0FOgoet723271GKVaHopV68hGzyopHdzZpsofXTu6U9zQz8GIZh7BZhgVCIB1xgUUBVizM2w0mTMs_hnM0AUkyquqwv2VWMPwCIlahn7HND3UBBjdtAXPWG20C_W-r1nhsaqDeTJe4tp53-Vv3XAXLRj8EPe07Wkh4jdz33O2fcHxn-5lbErWu7eM0urGoj3Zx0zj5WT5vlS7J-f35dPq4TLdJsTDJj0yqtSsgFNGiwKiBt0KrcgDVTgFwZrIuMEGptrBGks6wRulKNQgAl5uzu2DsEP02Po-xc1NS2qie_jTKdKnPIywm8P4I6-BgDWTkE16mwlwjy8J5EeXpP_APdBGJm</recordid><startdate>19721001</startdate><enddate>19721001</enddate><creator>Fulcomer, E.</creator><creator>Charap, S. H.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19721001</creationdate><title>Temperature and frequency dependence of exchange anisotropy effects in oxidized NiFe films</title><author>Fulcomer, E. ; Charap, S. H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c324t-4df282870530b1d18602b1fa5d0fd86005ad1964e109cdfd3ec44b3c8aba100a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1972</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fulcomer, E.</creatorcontrib><creatorcontrib>Charap, S. H.</creatorcontrib><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fulcomer, E.</au><au>Charap, S. H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Temperature and frequency dependence of exchange anisotropy effects in oxidized NiFe films</atitle><jtitle>Journal of applied physics</jtitle><date>1972-10-01</date><risdate>1972</risdate><volume>43</volume><issue>10</issue><spage>4184</spage><epage>4190</epage><pages>4184-4190</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>Hysteresis loops have been measured for thin NiFe films between 5 and 300 K using the magneto-optic Kerr effect. Films that are free of any surface oxide do not show a displacement of the easy-axis loop along the field axis, and the coercive force and anisotropy field are very weak functions of the temperature. Oxidized films show striking exchange anisotropy effects; displaced loops appear below a transition temperature ranging from 30 to 90 K as the film is more heavily oxidized. Loop width and anisotropy field increase with decreasing temperature, exhibiting a change in slope in the neighborhood of the transition temperature. The steady-state parameters have characteristic frequency dependences; with increasing frequency the loop displacement and anisotropy field increase and the loop width decreases in the range 0.05–100 Hz. The interpretation of these results in terms of thermal aftereffect taking place in the antiferromagnetic oxide is presented in a companion paper.</abstract><doi>10.1063/1.1660893</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0021-8979
ispartof Journal of applied physics, 1972-10, Vol.43 (10), p.4184-4190
issn 0021-8979
1089-7550
language eng
recordid cdi_proquest_miscellaneous_21865057
source AIP Digital Archive
title Temperature and frequency dependence of exchange anisotropy effects in oxidized NiFe films
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T09%3A04%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Temperature%20and%20frequency%20dependence%20of%20exchange%20anisotropy%20effects%20in%20oxidized%20NiFe%20films&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Fulcomer,%20E.&rft.date=1972-10-01&rft.volume=43&rft.issue=10&rft.spage=4184&rft.epage=4190&rft.pages=4184-4190&rft.issn=0021-8979&rft.eissn=1089-7550&rft_id=info:doi/10.1063/1.1660893&rft_dat=%3Cproquest_cross%3E21865057%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=21865057&rft_id=info:pmid/&rfr_iscdi=true