Ultralow surface energy self-assembled monolayers of iodo-perfluorinated alkanes on silica driven by halogen bonding

Compact self-assembled monolayers (SAMs) of perfluorododecyl iodide (I-PFC12) of reproducible thickness (1.2 nm) are shown to form on silicon wafers. The SAMs have a high fluorine content (95%) and convey an extremely low surface energy to the silicon wafers (4.3 mN m −1 ), lower than previously reported in the literature for perfluorinated monolayers, and stable for over eight weeks. Shorter chain iodo-perfluorinated (I-PFC8) or bromo-perfluorinated molecules (Br-PFC10) led to less dense layers. The monolayers are stable to heating up to 60 °C, with some loss up to 150 °C. The I-PFC12 monolayer increases the work function of silicon wafers from 3.6 V to 4.4 eV, a factor that could be gainfully used in photovoltaic applications. The I-PFC12 monolayers can be transferred into patterns onto silica substrates by micro-contact printing. The NMR data and the reproducible thickness point to an upright halogen bonding interaction between the iodine in I-PFC12 and the surface oxygen on the native silica layer. Self-assembled monolayers of iodo-perfluoro alkanes are shown to form on silica surfaces, guided by halogen bonding.