Multiple patterning of holographic photopolymers for increased refractive index contrast

We demonstrate that multiple exposures of a two-component holographic photopolymer can quadruple the refractive index contrast of the material beyond the single-exposure saturation limit. Quantitative phase microscopy of isolated structures written by laser direct-write lithography is used to charac...

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Veröffentlicht in:	Optics letters 2018-04, Vol.43 (8), p.1866-1869
Hauptverfasser:	Glugla, David J, Chosy, Madeline B, Alim, Marvin D, Childress, Kimberly K, Sullivan, Amy C, McLeod, Robert R
Format:	Artikel
Sprache:	eng
Schlagworte:	Direct laser writing Exposure Organic chemistry Photopolymers Refractivity
Online-Zugang:	Volltext
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