Synthesis and chemical transformation of Ni nanoparticles embedded in silica
Ni nanoparticles (NPs) catalyze many chemical reactions, in which they can become contaminated or agglomerate, resulting in poorer performance. We report deposition of silica (SiO ) onto Ni NPs from tetraethyl orthysilicate (TEOS) through a reverse microemulsion approach, which is accompanied by an...
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creator | Lynch, Brian B Anderson, Bryan D Kennedy, W Joshua Tracy, Joseph B |
description | Ni nanoparticles (NPs) catalyze many chemical reactions, in which they can become contaminated or agglomerate, resulting in poorer performance. We report deposition of silica (SiO
) onto Ni NPs from tetraethyl orthysilicate (TEOS) through a reverse microemulsion approach, which is accompanied by an unexpected etching process. Ni NPs with an average initial diameter of 27 nm were embedded in composite SiO
-overcoated Ni NPs (SiO
-Ni NPs) with an average diameter of 30 nm. Each SiO
-Ni NP contained a ∼7 nm oxidized Ni core and numerous smaller oxidized Ni NPs with diameters of ∼2 nm distributed throughout the SiO
shell. Etching of the Ni NPs is attributed to use of ammonium hydroxide as a catalyst for deposition of SiO
. Aliquots acquired during the deposition and etching process reveal agglomeration of SiO
and Ni NPs, followed by dissociation into highly uniform SiO
-Ni NPs. This etching and embedding process may also be extended to other core materials. The stability of SiO
-Ni NPs was also investigated under high-temperature oxidizing and reducing environments. The structure of the SiO
-Ni NPs remained significantly unchanged after both oxidation and reduction, which suggests structural durability when used for catalysis. |
doi_str_mv | 10.1039/c7nr06379b |
format | Article |
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) onto Ni NPs from tetraethyl orthysilicate (TEOS) through a reverse microemulsion approach, which is accompanied by an unexpected etching process. Ni NPs with an average initial diameter of 27 nm were embedded in composite SiO
-overcoated Ni NPs (SiO
-Ni NPs) with an average diameter of 30 nm. Each SiO
-Ni NP contained a ∼7 nm oxidized Ni core and numerous smaller oxidized Ni NPs with diameters of ∼2 nm distributed throughout the SiO
shell. Etching of the Ni NPs is attributed to use of ammonium hydroxide as a catalyst for deposition of SiO
. Aliquots acquired during the deposition and etching process reveal agglomeration of SiO
and Ni NPs, followed by dissociation into highly uniform SiO
-Ni NPs. This etching and embedding process may also be extended to other core materials. The stability of SiO
-Ni NPs was also investigated under high-temperature oxidizing and reducing environments. The structure of the SiO
-Ni NPs remained significantly unchanged after both oxidation and reduction, which suggests structural durability when used for catalysis.</description><identifier>ISSN: 2040-3364</identifier><identifier>EISSN: 2040-3372</identifier><identifier>DOI: 10.1039/c7nr06379b</identifier><identifier>PMID: 29181475</identifier><language>eng</language><publisher>England: Royal Society of Chemistry</publisher><subject>Ammonium hydroxide ; Catalysis ; Chemical reactions ; Chemical synthesis ; Deposition ; Embedding ; Etching ; Nanoparticles ; Oxidation ; Silicon dioxide</subject><ispartof>Nanoscale, 2017-01, Vol.9 (47), p.18959-18965</ispartof><rights>Copyright Royal Society of Chemistry 2017</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c352t-b1bd8d86a4356419ff501695ccc393debacaac5651811a8af65c9ec198f32a933</citedby><cites>FETCH-LOGICAL-c352t-b1bd8d86a4356419ff501695ccc393debacaac5651811a8af65c9ec198f32a933</cites><orcidid>0000-0002-3358-3703 ; 0000-0002-0001-626X ; 0000-0002-4407-4541</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/29181475$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Lynch, Brian B</creatorcontrib><creatorcontrib>Anderson, Bryan D</creatorcontrib><creatorcontrib>Kennedy, W Joshua</creatorcontrib><creatorcontrib>Tracy, Joseph B</creatorcontrib><title>Synthesis and chemical transformation of Ni nanoparticles embedded in silica</title><title>Nanoscale</title><addtitle>Nanoscale</addtitle><description>Ni nanoparticles (NPs) catalyze many chemical reactions, in which they can become contaminated or agglomerate, resulting in poorer performance. We report deposition of silica (SiO
) onto Ni NPs from tetraethyl orthysilicate (TEOS) through a reverse microemulsion approach, which is accompanied by an unexpected etching process. Ni NPs with an average initial diameter of 27 nm were embedded in composite SiO
-overcoated Ni NPs (SiO
-Ni NPs) with an average diameter of 30 nm. Each SiO
-Ni NP contained a ∼7 nm oxidized Ni core and numerous smaller oxidized Ni NPs with diameters of ∼2 nm distributed throughout the SiO
shell. Etching of the Ni NPs is attributed to use of ammonium hydroxide as a catalyst for deposition of SiO
. Aliquots acquired during the deposition and etching process reveal agglomeration of SiO
and Ni NPs, followed by dissociation into highly uniform SiO
-Ni NPs. This etching and embedding process may also be extended to other core materials. The stability of SiO
-Ni NPs was also investigated under high-temperature oxidizing and reducing environments. The structure of the SiO
-Ni NPs remained significantly unchanged after both oxidation and reduction, which suggests structural durability when used for catalysis.</description><subject>Ammonium hydroxide</subject><subject>Catalysis</subject><subject>Chemical reactions</subject><subject>Chemical synthesis</subject><subject>Deposition</subject><subject>Embedding</subject><subject>Etching</subject><subject>Nanoparticles</subject><subject>Oxidation</subject><subject>Silicon dioxide</subject><issn>2040-3364</issn><issn>2040-3372</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNpdkEtLAzEUhYMoVqsbf4AE3IhQzWOSSZZafEGp4GM9ZPKgKTNJTWYW_fdObe3C1b2L7xwOHwAXGN1iROWdLkNCnJayPgAnBBVoQmlJDvc_L0bgNOclQlxSTo_BiEgscFGyEzD7WIduYbPPUAUD9cK2XqsGdkmF7GJqVedjgNHBuYdBhbhSqfO6sRnatrbGWAN9gNk3Q-wMHDnVZHu-u2Pw9fT4OX2ZzN6eX6f3s4mmjHSTGtdGGMFVQRkvsHSOIcwl01pTSY2tlVZKM86GkVgJ5TjT0moshaNESUrH4Hrbu0rxu7e5q1qftW0aFWzsc4Ull5JgKjbo1T90GfsUhnUVQRgJgQjdUDdbSqeYc7KuWiXfqrSuMKo2jqtpOX__dfwwwJe7yr5urdmjf1LpD4N9dn8</recordid><startdate>20170101</startdate><enddate>20170101</enddate><creator>Lynch, Brian B</creator><creator>Anderson, Bryan D</creator><creator>Kennedy, W Joshua</creator><creator>Tracy, Joseph B</creator><general>Royal Society of Chemistry</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0002-3358-3703</orcidid><orcidid>https://orcid.org/0000-0002-0001-626X</orcidid><orcidid>https://orcid.org/0000-0002-4407-4541</orcidid></search><sort><creationdate>20170101</creationdate><title>Synthesis and chemical transformation of Ni nanoparticles embedded in silica</title><author>Lynch, Brian B ; Anderson, Bryan D ; Kennedy, W Joshua ; Tracy, Joseph B</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c352t-b1bd8d86a4356419ff501695ccc393debacaac5651811a8af65c9ec198f32a933</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Ammonium hydroxide</topic><topic>Catalysis</topic><topic>Chemical reactions</topic><topic>Chemical synthesis</topic><topic>Deposition</topic><topic>Embedding</topic><topic>Etching</topic><topic>Nanoparticles</topic><topic>Oxidation</topic><topic>Silicon dioxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lynch, Brian B</creatorcontrib><creatorcontrib>Anderson, Bryan D</creatorcontrib><creatorcontrib>Kennedy, W Joshua</creatorcontrib><creatorcontrib>Tracy, Joseph B</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>MEDLINE - Academic</collection><jtitle>Nanoscale</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lynch, Brian B</au><au>Anderson, Bryan D</au><au>Kennedy, W Joshua</au><au>Tracy, Joseph B</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Synthesis and chemical transformation of Ni nanoparticles embedded in silica</atitle><jtitle>Nanoscale</jtitle><addtitle>Nanoscale</addtitle><date>2017-01-01</date><risdate>2017</risdate><volume>9</volume><issue>47</issue><spage>18959</spage><epage>18965</epage><pages>18959-18965</pages><issn>2040-3364</issn><eissn>2040-3372</eissn><abstract>Ni nanoparticles (NPs) catalyze many chemical reactions, in which they can become contaminated or agglomerate, resulting in poorer performance. We report deposition of silica (SiO
) onto Ni NPs from tetraethyl orthysilicate (TEOS) through a reverse microemulsion approach, which is accompanied by an unexpected etching process. Ni NPs with an average initial diameter of 27 nm were embedded in composite SiO
-overcoated Ni NPs (SiO
-Ni NPs) with an average diameter of 30 nm. Each SiO
-Ni NP contained a ∼7 nm oxidized Ni core and numerous smaller oxidized Ni NPs with diameters of ∼2 nm distributed throughout the SiO
shell. Etching of the Ni NPs is attributed to use of ammonium hydroxide as a catalyst for deposition of SiO
. Aliquots acquired during the deposition and etching process reveal agglomeration of SiO
and Ni NPs, followed by dissociation into highly uniform SiO
-Ni NPs. This etching and embedding process may also be extended to other core materials. The stability of SiO
-Ni NPs was also investigated under high-temperature oxidizing and reducing environments. The structure of the SiO
-Ni NPs remained significantly unchanged after both oxidation and reduction, which suggests structural durability when used for catalysis.</abstract><cop>England</cop><pub>Royal Society of Chemistry</pub><pmid>29181475</pmid><doi>10.1039/c7nr06379b</doi><tpages>7</tpages><orcidid>https://orcid.org/0000-0002-3358-3703</orcidid><orcidid>https://orcid.org/0000-0002-0001-626X</orcidid><orcidid>https://orcid.org/0000-0002-4407-4541</orcidid></addata></record> |
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language | eng |
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source | Royal Society Of Chemistry Journals 2008- |
subjects | Ammonium hydroxide Catalysis Chemical reactions Chemical synthesis Deposition Embedding Etching Nanoparticles Oxidation Silicon dioxide |
title | Synthesis and chemical transformation of Ni nanoparticles embedded in silica |
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