Titanium Oxynitride Thin Films with Tunable Double Epsilon-Near-Zero Behavior for Nanophotonic Applications

Titanium oxynitride (TiO x N y ) thin films are fabricated using reactive magnetron sputtering. The mechanism of their growth formation is explained, and their optical properties are presented. The films grown when the level of residual oxygen in the background vacuum was between 5 nTorr to 20 nTorr...

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Veröffentlicht in:	ACS applied materials & interfaces 2017-09, Vol.9 (35), p.29857-29862
Hauptverfasser:	Braic, Laurentiu, Vasilantonakis, Nikolaos, Mihai, Andrei, Villar Garcia, Ignacio Jose, Fearn, Sarah, Zou, Bin, Alford, Neil McN, Doiron, Brock, Oulton, Rupert F, Maier, Stefan A, Zayats, Anatoly V, Petrov, Peter K
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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