Self-Registered Self-Assembly of Block Copolymers

Directed self-assembly (DSA) of block copolymer (BCP) thin films, especially with density multiplication, is one of the most promising options for further improving resolution and throughput in nanolithography. However, controlling defect density has been one of the major hurdles for many DSA applic...

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Veröffentlicht in:	ACS nano 2017-08, Vol.11 (8), p.7666-7673
Hauptverfasser:	Wan, Lei, Ruiz, Ricardo, Gao, He, Albrecht, Thomas R
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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