Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the so...

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Veröffentlicht in:Chemical communications (Cambridge, England) England), 2015-02, Vol.51 (11), p.2060-2063
Hauptverfasser: Lee, Austin W H, Pilapil, Brandy K, Ng, Him Wai, Gates, Byron D
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Sprache:eng
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Zusammenfassung:We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation.
ISSN:1359-7345
1364-548X
DOI:10.1039/c4cc07494g