Direct fabrication and characterization of high-aspect-ratio plasmonic nanogratings using tapered-sidewall molds

High-aspect-ratio plasmonic nanogratings are promising for applications such as polarimetric infrared (IR) detectors and IR emitters. Direct fabrication using conventional photolithography is necessary for their integration with other semiconductor devices. Nanogrooves with a high aspect ratio of 15...

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Veröffentlicht in:	Optical materials express 2017-02, Vol.7 (2), p.633-640
Hauptverfasser:	Ogawa, Shinpei, Kimata, Masafumi
Format:	Artikel
Sprache:	eng
Schlagworte:	Detectors Emitters Grooves Infrared detectors Molds Nanostructure Plasmonics Polarimetry
Online-Zugang:	Volltext
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