The effect of light-induced plasma on propagation of intense fs laser radiation in c-Si

The strong two-photon absorption and induced plasma are well-known factors restricting the penetration of intense focused laser pulses in silicon crystals. In this paper, we demonstrate that the role of plasma is not exhausted by the defocusing effect in a beam waist. We investigated experimentally...

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2016-04, Vol.122 (4), p.1-7, Article 293
Hauptverfasser:	Kononenko, V. V., Zavedeev, E. V., Gololobov, V. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Beams (radiation) Characterization and Evaluation of Materials Condensed Matter Physics Distortion Laser beams Lasers Machines Manufacturing Mathematical models Nanotechnology Optical and Electronic Materials Physics Physics and Astronomy Plasma (physics) Processes Propagation Silicon Surfaces and Interfaces Thin Films
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