Decomposition of SnH4 molecules on metal and metal-oxide surfaces

Atomic hydrogen cleaning is a promising method for EUV lithography systems, to recover from surface oxidation and to remove carbon and tin contaminants. Earlier studies showed, however, that tin may redeposit on nearby surfaces due to SnH4 decomposition. This phenomenon of SnH4 decomposition during...

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Veröffentlicht in:	Applied surface science 2014, Vol.288, p.673-676
Hauptverfasser:	UGUR, D, STORM, A. J, VERBERK, R, BROUWER, J. C, SLOOF, W. G
Format:	Artikel
Sprache:	eng
Schlagworte:	Carbon Cleaning Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Contaminants Contamination Cross-disciplinary physics: materials science rheology Decomposition Exact sciences and technology Lithography Metal oxides Physics Titanium dioxide
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