Effect of bias on the structure and properties of TiZrN thin films deposited by unbalanced magnetron sputtering

The objective is to investigate the substrate bias effect on the structure and properties of the TiZrN thin films. The TiZrN thin films were deposited by direct current unbalanced magnetron sputtering system with dual guns (Ti and Zr) targets onto Si (100) substrates at different substrate bias rang...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Thin solid films 2016-11, Vol.618, p.13-20
Hauptverfasser:	Lin, Yu-Wei, Chen, Hsi-An, Yu, Ge-Ping, Huang, Jia-Hong
Format:	Artikel
Sprache:	eng
Schlagworte:	Bias Electrical resistivity Hardness Magnetron sputtering Residual stress Silicon substrates Texture Thin films Titanium zirconium nitride
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!