Effect of carrier screening on ZnO-based resistive switching memory devices
The carrier screening effect occurs commonly in dielectric materials. It reduces the electric potential gradient, thus negatively affecting the functionality of resistive random access memory (RRAM) devices. An Au/ZnO film/Al-doped ZnO device fabricated in this work exhibited no resistive switching...
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description | The carrier screening effect occurs commonly in dielectric materials. It reduces the electric potential gradient, thus negatively affecting the functionality of resistive random access memory (RRAM) devices. An Au/ZnO film/Al-doped ZnO device fabricated in this work exhibited no resistive switching (RS), which was attributed to the carrier screening effect. Therefore, annealing was used for alleviating the screening effect, significantly enhancing the RS property. In addition, different on/off ratios were obtained for various bias values, and the screening effect was accounted for by investigating electron transport mechanisms. Furthermore, different annealing temperatures were employed to modulate the free carrier concentration in ZnO films to alleviate the screening effect. The maximal on/off ratio reached 10s at an annealing temperature of 600 ℃, yielding the lowest number of free carriers and the weakest screening effect in ZnO films. This work investigates the screening effect in RS devices. The screening effect not only modulates the characteristics of memory devices but also provides insight into the mechanism of RS in these devices. |
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It reduces the electric potential gradient, thus negatively affecting the functionality of resistive random access memory (RRAM) devices. An Au/ZnO film/Al-doped ZnO device fabricated in this work exhibited no resistive switching (RS), which was attributed to the carrier screening effect. Therefore, annealing was used for alleviating the screening effect, significantly enhancing the RS property. In addition, different on/off ratios were obtained for various bias values, and the screening effect was accounted for by investigating electron transport mechanisms. Furthermore, different annealing temperatures were employed to modulate the free carrier concentration in ZnO films to alleviate the screening effect. The maximal on/off ratio reached 10s at an annealing temperature of 600 ℃, yielding the lowest number of free carriers and the weakest screening effect in ZnO films. This work investigates the screening effect in RS devices. The screening effect not only modulates the characteristics of memory devices but also provides insight into the mechanism of RS in these devices.</description><identifier>ISSN: 1998-0124</identifier><identifier>EISSN: 1998-0000</identifier><identifier>DOI: 10.1007/s12274-016-1267-7</identifier><language>eng</language><publisher>Beijing: Tsinghua University Press</publisher><subject>Annealing ; Atomic/Molecular Structure and Spectra ; Biomedicine ; Biotechnology ; Carrier density ; Carriers ; Chemistry and Materials Science ; Condensed Matter Physics ; Data storage ; Devices ; Dielectrics ; Electric potential ; Electron transport ; Genetic screening ; Insulators ; Materials Science ; Memory devices ; Nanotechnology ; Random access memory ; Research Article ; Screening ; Switching ; Zinc oxide</subject><ispartof>Nano research, 2017, Vol.10 (1), p.77-86</ispartof><rights>Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2017</rights><rights>Nano Research is a copyright of Springer, (2017). All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c409t-e79d73ffdde15cc9236a59b79eae588d7bcef81b13c82f9b1d3c5ddd11f4ab1f3</citedby><cites>FETCH-LOGICAL-c409t-e79d73ffdde15cc9236a59b79eae588d7bcef81b13c82f9b1d3c5ddd11f4ab1f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/71233X/71233X.jpg</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s12274-016-1267-7$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s12274-016-1267-7$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,4010,27900,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Sun, Yihui</creatorcontrib><creatorcontrib>Yan, Xiaoqin</creatorcontrib><creatorcontrib>Zheng, Xin</creatorcontrib><creatorcontrib>Li, Yong</creatorcontrib><creatorcontrib>Liu, Yichong</creatorcontrib><creatorcontrib>Shen, Yanwei</creatorcontrib><creatorcontrib>Ding, Yi</creatorcontrib><creatorcontrib>Zhang, Yue</creatorcontrib><title>Effect of carrier screening on ZnO-based resistive switching memory devices</title><title>Nano research</title><addtitle>Nano Res</addtitle><addtitle>Nano Research</addtitle><description>The carrier screening effect occurs commonly in dielectric materials. It reduces the electric potential gradient, thus negatively affecting the functionality of resistive random access memory (RRAM) devices. An Au/ZnO film/Al-doped ZnO device fabricated in this work exhibited no resistive switching (RS), which was attributed to the carrier screening effect. Therefore, annealing was used for alleviating the screening effect, significantly enhancing the RS property. In addition, different on/off ratios were obtained for various bias values, and the screening effect was accounted for by investigating electron transport mechanisms. Furthermore, different annealing temperatures were employed to modulate the free carrier concentration in ZnO films to alleviate the screening effect. The maximal on/off ratio reached 10s at an annealing temperature of 600 ℃, yielding the lowest number of free carriers and the weakest screening effect in ZnO films. This work investigates the screening effect in RS devices. 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resistive switching memory devices</atitle><jtitle>Nano research</jtitle><stitle>Nano Res</stitle><addtitle>Nano Research</addtitle><date>2017</date><risdate>2017</risdate><volume>10</volume><issue>1</issue><spage>77</spage><epage>86</epage><pages>77-86</pages><issn>1998-0124</issn><eissn>1998-0000</eissn><abstract>The carrier screening effect occurs commonly in dielectric materials. It reduces the electric potential gradient, thus negatively affecting the functionality of resistive random access memory (RRAM) devices. An Au/ZnO film/Al-doped ZnO device fabricated in this work exhibited no resistive switching (RS), which was attributed to the carrier screening effect. Therefore, annealing was used for alleviating the screening effect, significantly enhancing the RS property. In addition, different on/off ratios were obtained for various bias values, and the screening effect was accounted for by investigating electron transport mechanisms. Furthermore, different annealing temperatures were employed to modulate the free carrier concentration in ZnO films to alleviate the screening effect. The maximal on/off ratio reached 10s at an annealing temperature of 600 ℃, yielding the lowest number of free carriers and the weakest screening effect in ZnO films. This work investigates the screening effect in RS devices. The screening effect not only modulates the characteristics of memory devices but also provides insight into the mechanism of RS in these devices.</abstract><cop>Beijing</cop><pub>Tsinghua University Press</pub><doi>10.1007/s12274-016-1267-7</doi><tpages>10</tpages></addata></record> |
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subjects | Annealing Atomic/Molecular Structure and Spectra Biomedicine Biotechnology Carrier density Carriers Chemistry and Materials Science Condensed Matter Physics Data storage Devices Dielectrics Electric potential Electron transport Genetic screening Insulators Materials Science Memory devices Nanotechnology Random access memory Research Article Screening Switching Zinc oxide |
title | Effect of carrier screening on ZnO-based resistive switching memory devices |
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