Sn microparticles made by plasma-induced dewetting
Micrometer-scale Sn particles are produced by plasma treating Sn films from 50nm to 2000nm on silicon oxide substrates. Plasma treatment is conducted using an inductively coupled plasma source. Behaviors of spinodal dewetting as well as hole nucleation and growth are observed when analyzing the aver...
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| Veröffentlicht in: | Thin solid films 2016-12, Vol.620, p.165-169 |
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| container_title | Thin solid films |
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| creator | Choe, H.J. Kwon, S.-H. Choe, C. Lee, J.-J. Woo, C.-H. |
| description | Micrometer-scale Sn particles are produced by plasma treating Sn films from 50nm to 2000nm on silicon oxide substrates. Plasma treatment is conducted using an inductively coupled plasma source. Behaviors of spinodal dewetting as well as hole nucleation and growth are observed when analyzing the average particle size with its initial film thickness and monitoring the morphological evolution of the dewetting film. A range of RF powers are evaluated to observe changes in particle size and size distribution. When increasing the RF power of the plasma treatment, the particle size and size distribution decreases, while the number of particles per area increases. With the help of the dewetting results on smooth substrates, an attempt is made to produce an array of Sn particles using a templated substrate to imitate the Sn solder bumps used in semiconductor packaging.
•Micrometer-scale Sn particles are produced by plasma treating Sn films.•Mechanism of Sn film dewetting is investigated.•Size and size distribution of Sn particles are controlled by varying experimental conditions. |
| doi_str_mv | 10.1016/j.tsf.2016.07.081 |
| format | Article |
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•Micrometer-scale Sn particles are produced by plasma treating Sn films.•Mechanism of Sn film dewetting is investigated.•Size and size distribution of Sn particles are controlled by varying experimental conditions.</description><subject>Dewetting</subject><subject>Film thickness</subject><subject>Inductively coupled plasma</subject><subject>Monitoring</subject><subject>Nuclear power generation</subject><subject>Particle size distribution</subject><subject>Particles</subject><subject>Plasma</subject><subject>Semiconductors</subject><subject>Solder bumps</subject><subject>Substrates</subject><subject>Tin</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp9kMtOwzAQRS0EEqXwAeyyZJMwY7uxLVao4iVVYgGsrdSZIFd5YSeg_j2uyprVzOKeK93D2DVCgYDl7a6YYlPw9BagCtB4whaolcm5EnjKFgAS8hIMnLOLGHcAgJyLBeNvfdZ5F4axCpN3LcWsq2rKtvtsbKvYVbnv69lRndX0Q9Pk-89LdtZUbaSrv7tkH48P7-vnfPP69LK-3-ROCJhy4sZooRFINiiMBi5hWzelc44crUBItWqM4ymMkpQsjXZCk0MiQE0kluzm2DuG4WumONnOR0dtW_U0zNGiLuWKG650iuIxmobEGKixY_BdFfYWwR782J1NfuzBjwVlk5_E3B0ZShu-PQUbnac-TfWB3GTrwf9D_wLYIWys</recordid><startdate>20161201</startdate><enddate>20161201</enddate><creator>Choe, H.J.</creator><creator>Kwon, S.-H.</creator><creator>Choe, C.</creator><creator>Lee, J.-J.</creator><creator>Woo, C.-H.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20161201</creationdate><title>Sn microparticles made by plasma-induced dewetting</title><author>Choe, H.J. ; Kwon, S.-H. ; Choe, C. ; Lee, J.-J. ; Woo, C.-H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c330t-e29983810e4f13980240bdf6cccece503475f9c233014e74698c38ec1ee018ee3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Dewetting</topic><topic>Film thickness</topic><topic>Inductively coupled plasma</topic><topic>Monitoring</topic><topic>Nuclear power generation</topic><topic>Particle size distribution</topic><topic>Particles</topic><topic>Plasma</topic><topic>Semiconductors</topic><topic>Solder bumps</topic><topic>Substrates</topic><topic>Tin</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Choe, H.J.</creatorcontrib><creatorcontrib>Kwon, S.-H.</creatorcontrib><creatorcontrib>Choe, C.</creatorcontrib><creatorcontrib>Lee, J.-J.</creatorcontrib><creatorcontrib>Woo, C.-H.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Choe, H.J.</au><au>Kwon, S.-H.</au><au>Choe, C.</au><au>Lee, J.-J.</au><au>Woo, C.-H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Sn microparticles made by plasma-induced dewetting</atitle><jtitle>Thin solid films</jtitle><date>2016-12-01</date><risdate>2016</risdate><volume>620</volume><spage>165</spage><epage>169</epage><pages>165-169</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><abstract>Micrometer-scale Sn particles are produced by plasma treating Sn films from 50nm to 2000nm on silicon oxide substrates. Plasma treatment is conducted using an inductively coupled plasma source. Behaviors of spinodal dewetting as well as hole nucleation and growth are observed when analyzing the average particle size with its initial film thickness and monitoring the morphological evolution of the dewetting film. A range of RF powers are evaluated to observe changes in particle size and size distribution. When increasing the RF power of the plasma treatment, the particle size and size distribution decreases, while the number of particles per area increases. With the help of the dewetting results on smooth substrates, an attempt is made to produce an array of Sn particles using a templated substrate to imitate the Sn solder bumps used in semiconductor packaging.
•Micrometer-scale Sn particles are produced by plasma treating Sn films.•Mechanism of Sn film dewetting is investigated.•Size and size distribution of Sn particles are controlled by varying experimental conditions.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2016.07.081</doi><tpages>5</tpages></addata></record> |
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| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Dewetting Film thickness Inductively coupled plasma Monitoring Nuclear power generation Particle size distribution Particles Plasma Semiconductors Solder bumps Substrates Tin |
| title | Sn microparticles made by plasma-induced dewetting |
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