Prospects for quantitative and time-resolved double and continuous exposure off-axis electron holography

The technique of double exposure electron holography, which is based on the superposition of two off-axis electron holograms, was originally introduced before the availability of digital image processing to allow differences between electron-optical phases encoded in two electron holograms to be vis...

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Veröffentlicht in:	Ultramicroscopy 2017-07, Vol.178, p.48-61
Hauptverfasser:	Migunov, Vadim, Dwyer, Christian, Boothroyd, Chris B., Pozzi, Giulio, Dunin-Borkowski, Rafal E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Continuous exposure electron holography Double exposure electron holography Off-axis electron holography Transmission electron microscopy
Online-Zugang:	Volltext
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