Disordered structure of cubic iron silicide films on Si(111)

X-ray diffraction has been used to analyze a series of thin-film samples of Fe{sub {ital x}}Si as a function of thickness and the composition variable {ital x}. Unannealed samples are found to be composed entirely of a CsCl-type structure not present in the bulk phase diagram. A careful crystallogra...

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Veröffentlicht in:	Physical Review, B: Condensed Matter B: Condensed Matter, 1995-04, Vol.51 (15), p.9715-9721
Hauptverfasser:	Whiteaker, KL, Robinson, IK, Benson, C, Smilgies, DM, Onda, N, von Känel H
Format:	Artikel
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION CRYSTAL STRUCTURE IRON SILICIDES PHYSICS SILICON THIN FILMS VACANCIES X-RAY DIFFRACTION
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