Fabrication and characteristics of porous germanium films

Porous germanium films with good adhesion to the substrate were produced by annealing GeO 2 ceramic films in H 2 atmosphere. The reduction of GeO 2 started at the top of a film and resulted in a Ge layer with a highly porous surface. TEM and Raman measurements reveal small Ge crystallites at the top...

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Veröffentlicht in:Science and technology of advanced materials 2009-12, Vol.10 (6), p.065001-065001
Hauptverfasser: Jing, Chengbin, Zhang, Chuanjian, Zang, Xiaodan, Zhou, Wenzheng, Bai, Wei, Lin, Tie, Chu, Junhao
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container_issue 6
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container_title Science and technology of advanced materials
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creator Jing, Chengbin
Zhang, Chuanjian
Zang, Xiaodan
Zhou, Wenzheng
Bai, Wei
Lin, Tie
Chu, Junhao
description Porous germanium films with good adhesion to the substrate were produced by annealing GeO 2 ceramic films in H 2 atmosphere. The reduction of GeO 2 started at the top of a film and resulted in a Ge layer with a highly porous surface. TEM and Raman measurements reveal small Ge crystallites at the top layer and a higher degree of crystallinity at the bottom part of the Ge film; visible photoluminescence was detected from the small crystallites. Porous Ge films exhibit high density of holes (10 20 cm −3 ) and a maximum of Hall mobility at ∼225 K. Their p-type conductivity is dominated by the defect scattering mechanism.
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subjects germanium
porous structured film
semiconducting behavior
visible photoluminescence
title Fabrication and characteristics of porous germanium films
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