Characterization of electrochemically deposited films from aqueous and ionic liquid cobalt precursors toward hydrogen evolution reactions
•Co films deposition via aqueous and ionic liquid Precursors.•Hydrogen evolution produced from reactive surfaces.•Co deposited films characterized by SEM, AFM, EDX and XRD techniques. Electrodepositions of cobalt films were achieved using an aqueous or an ethylene glycol based non-aqueous solution c...
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| Veröffentlicht in: | Applied surface science 2016-11, Vol.385, p.282-288 |
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| creator | Dushatinski, Thomas Huff, Clay Abdel-Fattah, Tarek M. |
| description | •Co films deposition via aqueous and ionic liquid Precursors.•Hydrogen evolution produced from reactive surfaces.•Co deposited films characterized by SEM, AFM, EDX and XRD techniques.
Electrodepositions of cobalt films were achieved using an aqueous or an ethylene glycol based non-aqueous solution containing choline chloride (vitamin B4) with cobalt chloride hexahydrate precursor toward hydrogen evolution reactions from sodium borohydride (NaBH4) as solid hydrogen feedstock (SHF). The resulting cobalt films had reflectivity at 550nm of 2.2% for aqueously deposited films (ACoF) and 1.3% for non-aqueously deposited films (NCoF). Surface morphology studied by scanning electron microscopy showed a positive correlation between particle size and thickness. The film thicknesses were tunable between >100μm and |
| doi_str_mv | 10.1016/j.apsusc.2016.05.103 |
| format | Article |
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Electrodepositions of cobalt films were achieved using an aqueous or an ethylene glycol based non-aqueous solution containing choline chloride (vitamin B4) with cobalt chloride hexahydrate precursor toward hydrogen evolution reactions from sodium borohydride (NaBH4) as solid hydrogen feedstock (SHF). The resulting cobalt films had reflectivity at 550nm of 2.2% for aqueously deposited films (ACoF) and 1.3% for non-aqueously deposited films (NCoF). Surface morphology studied by scanning electron microscopy showed a positive correlation between particle size and thickness. The film thicknesses were tunable between >100μm and <300μm for each film. The roughness (Ra) value measurements by Dektak surface profiling showed that the NCoF (Ra=165nm) was smoother than the ACoF (Ra=418nm). The NCoFs and ACoFs contained only α phase (FCC) crystallites. The NCoFs were crystalline while the ACoFs were largely amorphous from X-ray diffraction analysis. The NCoF had an average Vickers hardness value of 84MPa as compared to 176MPa for ACoF. The aqueous precursor has a single absorption maximum at 510nm and the non-aqueous precursor had three absorption maxima at 630, 670, and 695nm. The hydrogen evolution reactions over a 1cm2 catalytic surface with aqueous NaBH4 solutions generated rate constants (K)=equal to 4.9×10−3min−1, 4.6×10−3min−1, and 3.3×10−3min−1 for ACoF, NCoF, and copper substrate respectively.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2016.05.103</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Absorption ; Chlorides ; Co films ; Cobalt ; Copper ; Crystallites ; Hydrogen evolution ; Ionic liquid ; Precursors ; Scanning electron microscopy</subject><ispartof>Applied surface science, 2016-11, Vol.385, p.282-288</ispartof><rights>2016 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c442t-500e4d448bb920497d264c1407b48483f4fcae789aaed0db489313c45d997f1a3</citedby><cites>FETCH-LOGICAL-c442t-500e4d448bb920497d264c1407b48483f4fcae789aaed0db489313c45d997f1a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.apsusc.2016.05.103$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3548,27922,27923,45993</link.rule.ids></links><search><creatorcontrib>Dushatinski, Thomas</creatorcontrib><creatorcontrib>Huff, Clay</creatorcontrib><creatorcontrib>Abdel-Fattah, Tarek M.</creatorcontrib><title>Characterization of electrochemically deposited films from aqueous and ionic liquid cobalt precursors toward hydrogen evolution reactions</title><title>Applied surface science</title><description>•Co films deposition via aqueous and ionic liquid Precursors.•Hydrogen evolution produced from reactive surfaces.•Co deposited films characterized by SEM, AFM, EDX and XRD techniques.
Electrodepositions of cobalt films were achieved using an aqueous or an ethylene glycol based non-aqueous solution containing choline chloride (vitamin B4) with cobalt chloride hexahydrate precursor toward hydrogen evolution reactions from sodium borohydride (NaBH4) as solid hydrogen feedstock (SHF). The resulting cobalt films had reflectivity at 550nm of 2.2% for aqueously deposited films (ACoF) and 1.3% for non-aqueously deposited films (NCoF). Surface morphology studied by scanning electron microscopy showed a positive correlation between particle size and thickness. The film thicknesses were tunable between >100μm and <300μm for each film. The roughness (Ra) value measurements by Dektak surface profiling showed that the NCoF (Ra=165nm) was smoother than the ACoF (Ra=418nm). The NCoFs and ACoFs contained only α phase (FCC) crystallites. The NCoFs were crystalline while the ACoFs were largely amorphous from X-ray diffraction analysis. The NCoF had an average Vickers hardness value of 84MPa as compared to 176MPa for ACoF. The aqueous precursor has a single absorption maximum at 510nm and the non-aqueous precursor had three absorption maxima at 630, 670, and 695nm. The hydrogen evolution reactions over a 1cm2 catalytic surface with aqueous NaBH4 solutions generated rate constants (K)=equal to 4.9×10−3min−1, 4.6×10−3min−1, and 3.3×10−3min−1 for ACoF, NCoF, and copper substrate respectively.</description><subject>Absorption</subject><subject>Chlorides</subject><subject>Co films</subject><subject>Cobalt</subject><subject>Copper</subject><subject>Crystallites</subject><subject>Hydrogen evolution</subject><subject>Ionic liquid</subject><subject>Precursors</subject><subject>Scanning electron microscopy</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp9UMtOwzAQtBBIlMIfcPCRS4odO68LEqp4SZW4wNly7Q115cSp7RSVP-CvcQlnTrs7uzOrGYSuKVlQQsvb7UIOYQxqkadpQYqEshM0o3XFsqKo-SmapUWTccbyc3QRwpYQmqftDH0vN9JLFcGbLxmN67FrMVhQ0Tu1gc4oae0BaxhcMBE0bo3tAm6967DcjeDGgGWvcWIaha3ZjUZj5dbSRjx4UKMPzgcc3af0Gm8O2rsP6DHsnR1_33lI31MTLtFZK22Aq786R--PD2_L52z1-vSyvF9livM8ZgUhwDXn9Xrd5IQ3lc5Lrign1ZrXvGYtb5WEqm6kBE10AhtGmeKFbpqqpZLN0c2kO3iXDIQoOhMUWCv7oxtBa1aUZVmQPJ3y6VR5F4KHVgzedNIfBCXimLzYiil5cUxekCKhLNHuJhokG3sDXgRloFegTUokCu3M_wI_oryS3Q</recordid><startdate>20161101</startdate><enddate>20161101</enddate><creator>Dushatinski, Thomas</creator><creator>Huff, Clay</creator><creator>Abdel-Fattah, Tarek M.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20161101</creationdate><title>Characterization of electrochemically deposited films from aqueous and ionic liquid cobalt precursors toward hydrogen evolution reactions</title><author>Dushatinski, Thomas ; Huff, Clay ; Abdel-Fattah, Tarek M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c442t-500e4d448bb920497d264c1407b48483f4fcae789aaed0db489313c45d997f1a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Absorption</topic><topic>Chlorides</topic><topic>Co films</topic><topic>Cobalt</topic><topic>Copper</topic><topic>Crystallites</topic><topic>Hydrogen evolution</topic><topic>Ionic liquid</topic><topic>Precursors</topic><topic>Scanning electron microscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Dushatinski, Thomas</creatorcontrib><creatorcontrib>Huff, Clay</creatorcontrib><creatorcontrib>Abdel-Fattah, Tarek M.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Dushatinski, Thomas</au><au>Huff, Clay</au><au>Abdel-Fattah, Tarek M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of electrochemically deposited films from aqueous and ionic liquid cobalt precursors toward hydrogen evolution reactions</atitle><jtitle>Applied surface science</jtitle><date>2016-11-01</date><risdate>2016</risdate><volume>385</volume><spage>282</spage><epage>288</epage><pages>282-288</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>•Co films deposition via aqueous and ionic liquid Precursors.•Hydrogen evolution produced from reactive surfaces.•Co deposited films characterized by SEM, AFM, EDX and XRD techniques.
Electrodepositions of cobalt films were achieved using an aqueous or an ethylene glycol based non-aqueous solution containing choline chloride (vitamin B4) with cobalt chloride hexahydrate precursor toward hydrogen evolution reactions from sodium borohydride (NaBH4) as solid hydrogen feedstock (SHF). The resulting cobalt films had reflectivity at 550nm of 2.2% for aqueously deposited films (ACoF) and 1.3% for non-aqueously deposited films (NCoF). Surface morphology studied by scanning electron microscopy showed a positive correlation between particle size and thickness. The film thicknesses were tunable between >100μm and <300μm for each film. The roughness (Ra) value measurements by Dektak surface profiling showed that the NCoF (Ra=165nm) was smoother than the ACoF (Ra=418nm). The NCoFs and ACoFs contained only α phase (FCC) crystallites. The NCoFs were crystalline while the ACoFs were largely amorphous from X-ray diffraction analysis. The NCoF had an average Vickers hardness value of 84MPa as compared to 176MPa for ACoF. The aqueous precursor has a single absorption maximum at 510nm and the non-aqueous precursor had three absorption maxima at 630, 670, and 695nm. The hydrogen evolution reactions over a 1cm2 catalytic surface with aqueous NaBH4 solutions generated rate constants (K)=equal to 4.9×10−3min−1, 4.6×10−3min−1, and 3.3×10−3min−1 for ACoF, NCoF, and copper substrate respectively.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2016.05.103</doi><tpages>7</tpages></addata></record> |
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| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Absorption Chlorides Co films Cobalt Copper Crystallites Hydrogen evolution Ionic liquid Precursors Scanning electron microscopy |
| title | Characterization of electrochemically deposited films from aqueous and ionic liquid cobalt precursors toward hydrogen evolution reactions |
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