Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process

Self-aligned double patterning (SADP) is one of the most promising techniques for sub-20 nm technology. Spacer-is-dielectric SADP using a cut process is getting popular because of its higher design flexibility; for example, it can decompose odd cycles without the need of inserting any stitch. This p...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	IEEE transactions on computer-aided design of integrated circuits and systems 2016-09, Vol.35 (9), p.1519-1531
Hauptverfasser:	Liu, Iou-Jen, Fang, Shao-Yun, Chang, Yao-Wen
Format:	Artikel
Sprache:	eng
Schlagworte:	Algorithms Color Decomposition design Design engineering Electronic mail Flexibility Layout Lithography manufacturability Patterning Process control Routers Routing Self alignment self-aligned double pattering (SADP) lithography Transaction processing Yttrium
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!