Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

Nucleation and conformality are important issues, when depositing thin films for demanding applications. In this study, iridium and iridium dioxide (IrO2) films were deposited by atomic layer deposition (ALD), using five different processes. Different reactants, namely, O2, air, consecutive O2 and H...

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Veröffentlicht in:	Langmuir 2016-10, Vol.32 (41), p.10559-10569
Hauptverfasser:	Mattinen, Miika, Hämäläinen, Jani, Gao, Feng, Jalkanen, Pasi, Mizohata, Kenichiro, Räisänen, Jyrki, Puurunen, Riikka L, Ritala, Mikko, Leskelä, Markku
Format:	Artikel
Sprache:	eng
Schlagworte:	Interfaces: Adsorption, Reactions, Films, Forces, Measurement Techniques, Charge Transfer, Electrochemistry, Electrocatalysis, Energy Production and Storage
Online-Zugang:	Volltext
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