Properties of n-Ge epilayer on Si substrate with in-situ doping technology

The properties of n-Ge epilayer deposited on Si substrate with in-situ doping technology in a cold-wall ultrahigh vacuum chemical vapor deposition（UHVCVD） system are investigated.The growth temperature of 500℃ is optimal for the n-Ge growth in our equipment with a phosphorus concentration of 1018cm-...

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