An Ultrafast I-V Measurement Technique Accounting for Capacitive and Leakage Currents in Reverse Mode for SiC Power Devices
An ultrafast I-V measurement technique has been developed to measure simultaneously C-V and leakage parameters of SiC power devices. After considering the coupled contribution of both static (leakage current) and dynamic (capacitive current) aspects with respect to high dV/dt voltage ramps, a time-b...
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Veröffentlicht in: | Materials Science Forum 2016-05, Vol.858, p.422-425 |
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description | An ultrafast I-V measurement technique has been developed to measure simultaneously C-V and leakage parameters of SiC power devices. After considering the coupled contribution of both static (leakage current) and dynamic (capacitive current) aspects with respect to high dV/dt voltage ramps, a time-based characterization is detailed and validated on SiC Junction Barrier Schottky (JBS) power diodes. |
doi_str_mv | 10.4028/www.scientific.net/MSF.858.422 |
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subjects | Accounting Diodes Electric potential Electronic devices Leakage current Ramps Silicon carbide Voltage |
title | An Ultrafast I-V Measurement Technique Accounting for Capacitive and Leakage Currents in Reverse Mode for SiC Power Devices |
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