Low temperature removal of surface oxides and hydrocarbons from Ge(100) using atomic hydrogen

[Display omitted] •Preparation of a clean, well-ordered Ge(100) surface with atomic hydrogen.•Surface oxide layers removed by AHC at room temperature, but not hydrocarbons.•Increasing surface temperature during AHC dramatically improves efficiency.•AHC with the surface heated to 250°C led to a near...

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Veröffentlicht in:	Applied surface science 2016-08, Vol.379, p.1-7
Hauptverfasser:	Walker, M., Tedder, M.S., Palmer, J.D., Mudd, J.J., McConville, C.F.
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Atomic hydrogen cleaning Cleaning Damage Germanium Hydrocarbons Low energy electron diffraction Oxides Photoelectron spectroscopy Semiconductors Surface cleaning Ultraviolet photoelectron spectroscopy X-ray photoelectron spectroscopy
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