Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

The properties and performance of thin films deposited by plasma assisted processes are closely related to their manufacturing techniques and processes. The objective of the current study is to investigate the modification of plasma parameters occurring during hydrogen addition in N2  +  Ar magnetro...

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Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 2016-06, Vol.49 (22), p.225203-225212
Hauptverfasser:	Saikia, P, Bhuyan, H, Diaz-Droguett, D E, Guzman, F, Mändl, S, Saikia, B K, Favre, M, Maze, J R, Wyndham, E
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Hydrogen Magnetic properties magnetron plasma Partial pressure Plasma (physics) plasma parameters Secondary ion mass spectrometry Thin films Titanium nitride titanium nitride thin film
Online-Zugang:	Volltext
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